Kla Corporation

Carl Zeiss Smt Gmbh

Vera (Guorong) Zhuang

Gary V Lopez Lopez

John Savee

Evgeniia Butaeva

Gildardo Rios Delgado

Matthew Derstine

Grace H Chen

Felix Lange

Larissa Walter

An optical system includes a bulk material including a fluorine (F)-containing optical material. The bulk material is exposed to an environment at a pressure ranging from atmospheric to vacuum when the bulk material is under extreme ultra-violet (EUV), vacuum ultra-violet (VUV), deep ultra-violet (DUV) and/or UV radiation. The environment includes at least one type of gas or vapor. The at least one type of gas or vapor includes polar molecules.

Protection of optical materials of optical components from radiation degradation

A material recovery system for an optical component includes a reservoir containing gas and configured to supply a gas flow containing the gas. The material recovery system also includes an ion beam generator disposed on the reservoir and configured to receive the gas flow and to ionize the gas in the gas flow to generate an ion beam. The ion beam is configured to be directed to the optical component to remove at least a portion of a F-containing optical material degraded by exposure to VUV radiation, DUV radiation, and/or photo-contamination.

Material recovery systems for optical components

Growing community of inventors

San Jose, CA, United States of America

Vera (Guorong) Zhuang