University of Missouri

Venumadhav Korampally

Shubhra Gangopadhyay

Keshab Gangopadhyay

Sheila Ann Grant

Shantanu Bhattacharya

Yuanfang Gao

Steven B Kleiboeker

Sangho Bok

Luis Polo-Parada

A DNA amplification device utilizing a polydimethylsiloxane (PDMS) and silicon substrate coated with spin-on glass (SOG) is provided. This PDMS layer is irreversibly bonded to the SOG layer of the silicon substrate using oxygen plasma. The amplification device is an inexpensive, microfluidic device, which can be utilized as a portable thermo-cycler to perform PCR amplification of DNA in the field.

Reusable PCR amplification system and method

Preparation of Free-Flowing Organosilica Nanoparticles by Forming a solution of an organosilica nanoparticle precursor in a mixed solvent system comprising a first solvent and a second solvent, wherein the first solvent is different from the second solvent, wherein the second solvent has a boiling point which is greater than a boiling point of the first solvent, and wherein the nanoparticle precursor has a greater solubility in the first solvent than in the second solvent; removing at least 50% of the first solvent to form nanoparticles having a mean particle size less than about 25 nanometers dispersed in the solution; adding a coupling agent to the solution to facilitate reacting of the coupling agent with the nanoparticles; and recovering the nanoparticles from the solution, wherein the recovered nanoparticles have the mean particle size of less than about 25 nanometers

Organosilica nanoparticles and method for making

A method for forming a nanoporous film pattern on a substrate comprising imparting differential surface energy to a surface of a substrate to define first areas having a first surface energy conducive to maintenance of a nanoporous film thereon and second areas having a second surface energy non-conducive to maintenance of a nanoporous film thereon, said first and second areas defining a differential surface energy pattern on the substrate; depositing a nanoporous film precursor onto the differential surface energy pattern; and curing the nanoporous film precursor to form the nanoporous film pattern.

Patterning of ultra-low refractive index high surface area nanoparticulate films

Nanoparticles having a mean particle size of less than about 25 nanometers and a mean pore size of less than 10 nanometers, and a mean surface area of at least 500 m/g; nanoporous films of such nanoparticles; and composites and devices containing such nanoparticles and nanoporous films.

Growing community of inventors

Columbia, MO, United States of America

Venumadhav Korampally