Intel Corporation

Vani Thirumala

Hok-Kin Choi

Valery M Dubin

Chin-Chang Cheng

Ting Zhong

Yongmei Wu

Embodiments of techniques for determining the concentrations of one or more acid components of a multiple acid solution are presented herein.

Multiple acid solution characterization

The present description relates to a process for measuring outgas emissions in fabrication chambers used for semiconductors, micromachines and the like. In one embodiment, the invention includes inserting a gas adsorption material into a processing chamber exhaust vent, running a process in the chamber, venting gasses in the chamber through the gas adsorption material, removing the adsorption material from the exhaust vent, and analyzing the adsorption material for gases.

Process for screening outgas emissions in semiconductor processing

A system and method for storing a solution containing a subset of a group consisting of a metal ion, a complexing agent, an ammonium salt, and a strong base and then nearer to a time of use in an electroless deposition process, using the solution to form an electroless deposition solution containing the entire group. In one embodiment of the invention, the metal ion includes a cobalt ion, the complexing agent includes citric acid, the ammonium salt includes ammonium chloride, and the strong base includes tetramethylammonium hydroxide.

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San Jose, CA, United States of America

Vani Thirumala