Asml Netherlands B.v.

Van Vuong Vy

Rogier Hendrikus Magdalena Cortie

Siegfried Alexander Tromp

Jim Vincent Overkamp

Johannes Henricus Wilhelmus Jacobs

Raymond Wilhelmus Louis Lafarre

Thibault Simon Mathieu Laurent

Koen Steffens

Martijn Houben

Ruud Hendrikus Martinus Johannes Bloks

Theodorus Wilhelmus Polet

Wilhelmus Franciscus Johannes Simons

Han Henricus Aldegonda Lempens

Gerben Pieterse

Andre Bernardus Jeunink

Adrianus Hendrik Koevoets

Christianus Wilhelmus Johannes Berendsen

Johannes Jacobs

Rogier Cortie

Daniel Elza Roeland Audenaerdt

Thibault Laurent

Ruud Bloks

Han Lempens

Wilhelmus Simons

Raymond Lafarre

An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

Object holder and lithographic apparatus

A lithographic apparatus comprising: a channel () for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (); a second material () between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material () between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.

Lithographic apparatus and method of manufacturing a lithographic apparatus

Growing community of inventors

Eindhoven, Netherlands

Van Vuong Vy