Motorola Corporation

Valli Arunachalam

Dean J Denning

John C Arnold

Peter L G Ventzek

Peter Lowell Ventzek

A method and an apparatus for forming a layer on a substrate are disclosed. In accordance with one embodiment, a substrate ( ) is placed into a chamber ( ) that includes a coil ( ) and a shield ( ) wherein the coil and the shield are electrically isolated by an isolation/support member ( ) having a first surface ( ) that is substantially contiguous with a surface of the coil and having a second surface ( ) that is substantially contiguous with a surface of the shield. A layer ( ) is then deposited onto the substrate ( ).

Method and apparatus for forming a layer on a substrate

A method and an apparatus for forming a layer on a substrate are disclosed. In accordance with one embodiment, a substrate (901) is placed into a chamber (30) that includes a coil (16) and a shield (14) wherein the coil and the shield are electrically isolated by an isolation/support member (32) having a first surface (321) that is substantially contiguous with a surface of the coil and having a second surface (322) that is substantially contiguous with a surface of the shield. A layer (1002, 1102) is then deposited onto the substrate (901).

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Austin, TX, United States of America

Valli Arunachalam