Asml Netherlands B.v.

Vadim Yourievich Timoshkov

Wim Tjibbo Tel

Hermanus Adrianus Dillen

Abraham Slachter

Stefan Hunsche

Antoine Gaston Marie Kiers

Youping Zhang

Yi Zou

Yana Cheng

Daan Maurits Slotboom

Chenxi Lin

Te-Sheng Wang

Yichen Zhang

Cyrus Emil Tabery

Koenraad Van Ingen Schenau

Maxime Philippe Frederic Genin

Marleen Kooiman

Fuming Wang

Marie-Claire Van Lare

Simon Philip Spencer Hastings

Tzu-Chao Chen

Sudharshanan Raghunathan

Aiqin Jiang

Boris Menchtchikov

Koen Wilhelmus Cornelis Adrianus Van Der Straten

Luis Alberto Colina Santamaría Colina

Methods related to improving a simulation processes and solutions (e.g., retargeted patterns) associated with manufacturing of a chip. A method includes obtaining a plurality of dose-focus settings, and a reference distribution based on measured values of a characteristic of a printed pattern associated with each setting of the plurality of dose-focus settings. The method further includes, based on an adjustment model and the plurality of dose-focus settings, determining a probability density function (PDF) of the characteristic such that an error between the PDF and the reference distribution is reduced. The PDF can be a function of the adjustment model and variance associated with dose, the adjustment model being configured to change a proportion of non-linear dose sensitivity contribution to the PDF. A process window can be adjusted based on the determined PDF of the characteristic.

Method for calibrating simulation process based on defect-based process window

A method for determining an image-metric of features on a substrate, the method including: obtaining a first image of a plurality of features on a substrate; obtaining one or more further images of a corresponding plurality of features on the substrate, wherein at least one of the one or more further images is of a different layer of the substrate than the first image; generating aligned versions of the first and one or more further images by performing an alignment process on the first and one or more further images; and calculating an image-metric in dependence on a comparison of the features in the aligned version of the first image and the corresponding features in the one or more aligned versions of the one or more further images.

Method in the manufacturing process of a device, a non-transitory computer-readable medium and a system configured to perform the method

A method for analyzing a process, the method including obtaining a multi-dimensional probability density function representing an expected distribution of values for a plurality of process parameters; obtaining a performance function relating values of the process parameters to a performance metric of the process; and using the performance function to map the probability density function to a performance probability function having the process parameters as arguments.

Method of manufacturing devices

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Veldhoven, Netherlands

Vadim Yourievich Timoshkov