Applied Materials Gmbh & Co Kg

Applied Materials, Inc.

Applied Films Gmbh & Co. Kg

Uwe Schüssler

Stefan Bangert

Ralph Lindenberg

Byung-Sung Kwak

Jose Manuel Dieguez-Campo

Jürgen Henrich

Andreas Lopp

Hans Georg Wolf

Tobias Stolley

Stefan Keller

Jörg Krempel-Hesse

Heike Landgraf

Andreas Jischke

Frank Fuchs

Michael Konig

Byung-sung Leo Kwak

A depositing arrangement for evaporation of a material is disclosed herein. The depositing arrangement has an alkali metal or alkaline earth metal for deposition of the material on a substrate. The deposition arrangement has a first chamber configured for liquefying the material; a valve being in fluid communication with the first chamber, and being downstream of the first chamber, wherein the valve is configured for control of the flow rate of the liquefied material through the valve. The deposition arrangement has an evaporation zone being in fluid communication with the valve, and being downstream of the valve, wherein the evaporation zone is configured for vaporizing the liquefied material; a heating unit to heat the material to higher temperatures before providing the liquid material in the evaporation zone; and one or more outlets for directing the vaporized material towards the substrate.

Evaporator, deposition arrangement, deposition apparatus and methods of operation thereof

A mask supportcomprises a frame elementand an elastic element. The elastic elementis fixed to the frame element. The elastic elementis a component integrally formed of a flexible material. It comprises a lever or arm portionhaving a first engagement protrusionextending in an angle of approximately 90&#xb0; from the free end of the arm portion. A mask assemblycomprises a laminar mask, e.g. manufactured from a thin metal foil, and connecting elements. The connecting elementsinclude an engagement portionfor engagement with the engagement protrusionof the elastic element. The maskmay be attached/stretched to the mask supportas well as to detached from the mask supportcomfortably.

Mask support, mask assembly, and assembly comprising a mask support and a mask

To be able to realize a relatively wide magnetron sputter cathode, it is proposed that on the vacuum side of a carrier () is disposed the sputter target () with a backing plate (), which maintains a gap () from the carrier (). The backing plate () is developed as a cooling plate. In it are located cooling means channels (), which, via an inlet () through the carrier (), are supplied with cooling fluid, which can flow out again via an outlet () through the carrier (). On the atmospheric side is located a magnet configuration ().

Magnetron sputter cathode

This invention relates to a coater for the coating, in particular, of large-area substrates by means of cathode sputtering, the coater having a coating chamber and, provided therein, a cathode assembly () where the material to be sputtered is located on a target () with a curved surface, the material to be sputtered being located, in particular, on the lateral surface of a cylinder, there being in a single coating chamber for a coherent coating zone at least three, preferably more, cathode assemblies () with rotatable, curved targets () positioned one beside the other.

Coater with a large-area assembly of rotatable magnetrons

The present invention relates to a coating plant, especially a vacuum coating plant, with a charging lock, especially a rectangular vacuum lock for a coating chamber, with a lock aperture () having a length of at least 1000 mm that comprises a shutter () for closing and opening the lock aperture and a latch () to secure the shutter, wherein there are provided means for moving the shutter and the latch from a first open position to a second closed position, and vice versa, these means assuring also that the movements of the shutter () and the latch () will be coupled with each other in such manner that the shutter () will be automatically secured by the latch () after the shutter has been closed and will be released again before it is opened.

Coating plant with a charging lock and device therefor

The invention relates to a drive mechanism for a vacuum treatment apparatus by which substrate holders can be transported around an axis (A&#x2014;A) from an entrance airlock to an exit airlock. A stationary supporting column () is disposed in the center and on it a rotatory drive chamber () is borne which has control rods () for a rotation and a radial displacement of the substrate holders. In the rotatory drive chamber (), a motor () and rotatory displacement drives for the control rods () are arranged on the supporting column (), the control rods being in active connection each with a corresponding substrate holder. To solve the problem of carrying substrates through the vacuum treatment apparatus, even substrates of great area, smoothly, at a slight angle to the vertical, not fastened to the substrate holders, it is provided that a) the motor () is joined to a stationary bearing carrier () in which a rotatory star-shaped array of cantilevers () is mounted, b) the cantilevers () are articulated at one end to bell-crank levers (), each of which has a pivot pin (), c) the other end of each of the bell-crank levers () is articulated to one of the control rods (), and that d) the pivot pins () of the bell-crank levers () are guided in a first stationary radial cam () whose shape determines the radial movements of the control rods (). A periodic, variable superposition of the radial movements is performed by variable tangential movements produced by a second stationary radial cam () with a bell-crank lever which is joined by a link () to the drive chamber ().

Drive mechanism for a vacuum treatment apparatus

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Aschaffenburg, Germany

Uwe Schüssler