Asml Netherlands B.v.

Uwe Bruno Heini Stamm

Gerardus Hubertus Petrus Maria Swinkels

Erik Roelof Loopstra

Vadim Yevgenyevich Banine

Johannes Hubertus Josephina Moors

Andrei Mikhailovich Yakunin

William N Partlo

Jan Bernard Plechelmus Van Schoot

Dzmitry Labetski

Olav Waldemar Vladimir Frijns

Vladimir Vitalevich Ivanov

Erik Petrus Buurman

Dennis De Graaf

Ivo Vanderhallen

Sven Pekelder

Hermanus Kreuwel

A radiation source having a fuel stream generator () that generates and directs a fuel stream () along a trajectory towards a plasma formation location (). A pre-pulse laser radiation assembly directs a first beam of laser radiation () at the fuel stream at the plasma formation location to generate a modified fuel target (). A main pulse laser radiation assembly directs a second beam of laser radiation () at the modified fuel target at the plasma formation location to generate a radiation generating plasma (). A collector () collects the radiation and directs it along an optical axis () of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.

Radiation source

An EUV radiation generation apparatus includes a laser configured to generate pulses of laser radiation, and an optical isolation apparatus that includes a rotatably mounted reflector and a radially positioned reflector. The rotatably mounted reflector and the laser are synchronized such that a reflective surface of the rotatably mounted reflector is in optical communication with the radially positioned reflector when the optical isolation apparatus receives a pulse of laser radiation to allow the pulse of laser radiation to pass to a plasma formation location and cause a radiation emitting plasma to be generated via vaporization of a droplet of fuel material. The rotatably mounted reflector and the laser are further synchronized such that the reflective surface of the rotatably mounted reflector is at least partially optically isolated from the radially positioned reflector when the optical isolation apparatus receives radiation reflected from the plasma formation location.

Lithographic apparatus, EUV radiation generation apparatus and device manufacturing method

An EUV lithographic apparatus includes a source collector apparatus in which the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma emitting the radiation. The source collector apparatus includes a chamber in fluid communication with a guide way external to the chamber. A pump for circulating buffer gas is part of the guide way, and provides a closed loop buffer gas flow. The gas flowing through the guide way traverses a gas decomposer wherein a compound of fuel material and buffer gas material is decomposed, so that decomposed buffer gas material can be fed back into the closed loop flow path.

Source collector, lithographic apparatus and device manufacturing method

An EUV radiation generation apparatus includes an optical gain medium configured to produce laser radiation for interaction with a target material to produce an EUV radiation-emitting plasma, and a structure defining an aperture through which the laser radiation may pass. The structure includes a radiation guide having an outer surface constructed and arranged to guide the laser radiation away from the optical gain medium.

EUV radiation generation apparatus

A radiation system includes a target material supply configured to supply droplets of target material along a trajectory, and a laser system that includes an amplifier and optics. The optics are configured to establish a first beam path which passes through the amplifier and through a first location on the trajectory, and to establish a second beam path which passes through the amplifier and through a second location on the trajectory. The laser system is configured to generate a first pulse of laser radiation when photons emitted from the amplifier are reflected along the first beam path by a droplet of target material at the first location on the trajectory. The laser system is configured to generate a second pulse of laser radiation when photons emitted from the amplifier are reflected along the second beam path by the droplet of target material at the second location on the trajectory.

Radiation system and lithographic apparatus

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Goettingen, Germany

Uwe Bruno Heini Stamm