Samsung Electronics Co., Ltd.

Useong Kim

Hee-jun Lee

Mincheol Kang

Woojoo Sim

Woo-Yong Cho

Xin Zhou

Mindy Lee

Bayram Yenikaya

Disclosed is an operating method of an electronic device for manufacture of a semiconductor device. The operating method includes receiving a layout image of the semiconductor device, generating an intermediate image by generating assist features based on main features of the layout image, evaluating a process result by performing simulation based on the intermediate image, and correcting the intermediate image by correcting shapes of the main features and/or the assist features of the intermediate image based on the process result.

Operating method of electronic device for semiconductor memory manufacture

Provided are a method of forming a mask, the method accurately and quickly restoring an image on the mask to the shape on the mask, and a mask manufacturing method using the method of forming the mask. The method of forming a mask includes obtaining first images by performing rasterization and image correction on shapes on the mask corresponding to first patterns on a wafer, obtaining second images by applying a transformation to the shapes on the mask, performing deep learning based on a transformation relationship between ones of the first images and ones of the second images corresponding to the first images, and forming a target shape on the mask corresponding to a target pattern on the wafer, based on the deep learning. The mask is manufactured based on the target shape on the mask.

Method of forming shape on mask based on deep learning, and mask manufacturing method using the method of forming the shape on mask

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Hwaseong-si, South Korea

Useong Kim