Balzers Aktiengesellschaft

Unaxis Trading Ag

Unaxis-balzers Aktiengesellschaft

Balzers Hochvakuum Ag

Unakis Trading Ag

Urs Schwendener

Walter Haag

Siegfried Krassnitzer

Pius Grunenfelder

Markus Schlegel

Hans Hirscher

Pius Gruenenfelder

For optimizing the yield of atomized-off material on a magnetron atomization source, a process space, on the source side, is predominantly walled by the atomization surface of the target body. The magnetron atomization source has a target body with a mirror-symmetrical, concavely constructed atomization surface with respect to at least one plane and a magnetic circuit arrangement operable to generate a magnetic field over the atomization surface. The magnetic circuit arrangement includes an anode arrangement, a receiving frame which extends around an edge of the target body and is electrically insulated with respect thereto. The receiving frame has a receiving opening for at least one workpiece to be coated. The magnetron source can be used to provide storage disks, such as CDs, with an atomization coating.

Magnetron atomization source and method of use thereof

A method for producing flat panels for TFT or plasma display applications includes forming a sputter source within a sputter coating chamber, the source having at least two electrically mutually isolated stationery bar-shaped target arrangements. A controlled magnet arrangement provided under each target with a time-varying magnetron field.

Method of producing flat panels

A sputter source has at least two electrically mutually isolated stationar bar-shaped target arrangements mounted one alongside the other and separated by respective slits. Each of the target arrangements includes a respective electric pad so that each target arrangement may be operated electrically independently from the other target arrangement. Each target arrangement also has a controlled magnet arrangement for generating a time-varying magnetron field upon the respective target arrangement. The magnet arrangements may be controlled independently from each others. The source further has an anode arrangement with anodes alongside and between the target arrangements and/or along smaller sides of the target arrangements.

Magnetron sputtering source

A sputter source has at least two electrically mutually isolated stationary bar-shaped target arrangements mounted one alongside the other and separated by respective slits. Each of the target arrangements includes a respective electric pad so that each target arrangement may be operated electrically independently from the other target arrangement. Each target arrangement also has a controlled magnet arrangement for generating a time-varying magnetron field upon the respective target arrangement. The magnet arrangements may be controlled independently from each other. The source further has an anode arrangement with anodes alongside and between the target arrangements and/or along smaller sides of the target arrangements.

In order to permit a mounting and demounting of targets free of tools and essentially of friction, snap pins are provided on the system side which, when the target is inserted, automatically engage in a groove which is machined laterally into the target. A releasing slide permits the return of the pins. When the cooling system is acted upon by pressure, a heat transfer membrane is placed against the rear of the target and presses the target onto the snapped-in pins. The pins are released by a releasing slide after the cooling system is relieved from the pressure.

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Buchs, Switzerland

Urs Schwendener