Samsung Electronics Co., Ltd.

Industry-university Cooperation Foundation Hanyang University

Un-gyu Paik

Han-su Kim

Jae-man Choi

Moon-seok Kwon

Min-sang Song

Tae-seob Song

Won-il Park

Ye-hwan Kim

Ji-hoon Seo

Tae-seup Song

Jae-young Choi

Seung-sik Hwang

Seon-mi Yoon

Jung-ock Park

Jeong-kuk Shon

Myung-hoon Kim

Suk-gi Hong

Young-sin Park

Jea-Gun Park

Jin-Hyung Park

Jae-Hyung Lim

Hao Cui

Jong-Young Cho

Hee-Sub Hwang

Han-Su Kim

Jin-hyon Lee

Ki-chun Kil

Myung-Hoon Kim

Min-Sang Song

Moon-Seok Kwon

Jae-Man Choi

Jeong-Kuk Shon

Seung-Sik Hwang

A slurry composition for the CMP process includes a dispersion medium, and ceria particles having a NOfunctional group bonded to surfaces thereof. The ceria particles are contained in an amount of about 0.1 parts by weight to about 15 parts by weight based on 100 parts by weight of the dispersion medium.

Slurry composition for chemical mechanical polishing, method of preparing the same, and polishing method using the same

A negative electrode and a lithium battery including the same, the negative electrode including nanotubes including a Group 14 metal/metalloid, disposed on a conductive substrate.

Negative electrode including group 14 metal/metalloid nanotubes, lithium battery including the negative electrode, and method of manufacturing the negative electrode

A negative electrode includes nanotubes including a metal/metalloid, disposed on a conductive substrate, and having opened ends. A lithium battery includes the negative electrode.

Negative electrode including metal/metalloid nanotubes, lithium battery including the negative electrode, and method of manufacturing the negative electrode

Provided are a multi-selective polishing slurry composition and a semiconductor element production method using the same. A silicon film provided with element patterns is formed on the uppermost part of a substrate having a first region and a second region. The element pattern density on the first region is higher than the element pattern density on the second region. Formed in sequence on top of the element patterns are a first silicon oxide film, a silicon nitride film and a second silicon oxide film. The substrate is subjected to chemical-mechanical polishing until the silicon film is exposed, by using a polishing slurry composition containing a polishing agent, a silicon nitride film passivation agent and a silicon film passivation agent. The polishing slurry composition may be a mixture of 100 parts by weight of a polishing agent suspension, containing a polishing agent, and from 40 to 120 parts by weight of an additive solution, and the additive solution can contain 100 parts by weight of a solvent, from 0.01 to 5 parts by weight of a silicon nitride film passivation agent and from 0.01 to 5 parts by weight of a silicon film passivation agent.

Multi-selective polishing slurry composition and a semiconductor element production method using the same

An anode active material, an anode including the anode active material, a lithium battery including the anode, and a method of preparing the anode active material. The anode active material includes: a multilayer metal nanotube including: an inner layer; and an outer layer on the inner layer, wherein the inner layer includes a first metal having an atomic number equal to 13 or higher, and the outer layer includes a second metal different from the first metal.

Anode active material including a multilayer metal nanotube, anode including the anode active material, lithium battery including the anode, and method of preparing the anode active material

A cathode, a method of forming the cathode and a lithium battery including the cathode. The cathode includes a current collector and a cathode active material layer disposed on the current collector; the cathode active material layer includes a lithium transition metal oxide having a spinel structure, a conductive agent, and a binder; and at least a portion of a surface of the cathode active material layer is fluorinated.

Cathode, method of preparing the same, and lithium battery including the cathode

Disclosed herein are a dispersed solution of carbon nanotubes including carbon nanotubes, an organic solvent, a spacer, and a dispersant, and a method of preparing the same. The dispersed solution of the carbon nanotubes includes both the spacer, which reduces the van der Waals force of the carbon nanotubes and prevents bundling of the carbon nanotubes, and the dispersant, which maintains the debundling and stability of the carbon nanotubes, thereby improving the dispersibility of the carbon nanotubes. The method of preparing the dispersed solution of the carbon nanotubes can easily produce a dispersed solution of carbon nanotubes without performing a separate chemical treatment.

Dispersed solution of carbon nanotubes and method of preparing the same

A catalyst slurry, an electrode prepared by using the same, and a fuel cell including the electrode. The catalyst slurry includes: a catalyst material; a binder; and a solvent including a first liquid for dissolving the binder and a second liquid having a viscosity that is higher than that of the first liquid.

Catalyst slurry, electrode prepared by using the catalyst slurry, and fuel cell including the electrode

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Seoul, South Korea

Un-gyu Paik