Ford Motor Company Limited

Umar Riaz

James W Proscia

Chaitanya Kumar Narula

Ashima Varshney

Novel single-source volatile precursor compounds are disclosed, having the general formula

Single source volatile precursor for SiO.sub.2.TiO.sub.2 powders and

A film of fluorine-doped tungsten oxide is provided on a substrate by reacting together tungsten alkoxide, an oxygen-containing compound, and a fluorine-containing compound.

Atmospheric pressure CVD process for preparing fluorine-doped tungsten

The procsses disclosed is for preparing a film of fluorine-modified tungsten oxide on a substrate. The process comprises providing a tungsten oxide film on the substrate and then exposing the tungsten oxide film at an elevated temperature to a stream of a gaseous fluorocarbon. The exposure takes place for a time sufficient to modify the tungsten oxide with fluorine and form a film having modified infrared adsorption and reflectant properties.

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Ann Arbor, MI, United States of America

Umar Riaz