Carl Zeiss Microscopy Gmbh

Carl Zeiss Nts Gmbh

Ulrike Zeile

Andreas Schertel

Dirk Zeidler

Emmerich Bertagnolli

Dirk Preikszas

Michael Albiez

Michel Aliman

Christian Hendrich

Alexander Laue

Hubert Mantz

Wolfram Buehler

Heinz Wanzenboeck

Alexander Rosenthal

Camille Stebler

Holger Dömer

Wolfram Bühler

Matthias Knappich

Albrecht Glasmachers

Matthias Lang

Heinz Wanzenböck

An apparatus for focusing and for storage of ions and an apparatus for separation of a first pressure area from a second pressure area are disclosed, in particular for an analysis apparatus for ions. A particle beam device may have at least one of the abovementioned apparatuses. A container for holding ions and at least one multipole unit are provided. The multipole unit has a through-opening with a longitudinal axis as well as a multiplicity of electrodes. A first set of the electrodes is at a first radial distance from the longitudinal axis. A second set of the electrodes is in each case at a second radial distance from the longitudinal axis. The first radial distance is less than the second radial distance. Alternatively or additionally, the apparatus may have an elongated opening with a radial extent. The opening has a longitudinal extent which is greater than the radial extent.

Printed circuit board multipole for ion focusing

A system for supplying a process gas to a processing location of a particle beam system is disclosed. The system for supplying the processing gas includes a gas reservoir, a gas conduit, a pipe located close to the processing location, a valve between the gas conduit and the pipe, and a controller configured to open and to close the valve to switch the system from a first mode of operation in which process gas is not supplied to the processing location to a second mode of operation in which process gas is supplied to the processing location. The controller can alternately open and close the valve in cycles. Each cycle can include a first duration in which the valve is open and a second duration in which the valve is closed. The ratio of the first duration to the second duration can be changed.

Particle beam system including a supply of process gas to a processing location

A processing system for processing an object () is provided, wherein the processing system is adapted, to focus a first energy beam, in particular an electron beam (), and a second energy beam, in particular an ion beam (), on a focusing region () in which a object () to be processed is arrangeable. A processing chamber wall () having two openings () for traversal of both energy beams and a connector () for supplying process gas delimits a processing chamber () from a vacuum chamber () of the processing system. Processing the object by activating the process gas through one of the energy beams and inspecting the object via one of the energy beams is enabled for different orientations of the object relative to a propagation direction of one of the energy beams.

Processing system

An aperture unit for a particle beam device, in particular an electron beam device, is disclosed. Deposit supporting units are arranged at the aperture unit, with which deposit supporting units contaminations can be bound in such a way that the contaminations can no longer deposit at an aperture opening of the aperture unit. Coatings which can be arranged on the aperture unit make it possible to reduce interactions which cause contaminations to deposit at the aperture opening.

Aperture unit for a particle beam device

A combined inspection system for inspecting an object disposable in an object plane, comprises a particle-optical system, which provides a particle-optical beam path, and a light-optical system, which provides a light-optical beam path; and a controller, wherein the light-optical system comprises at least one light-optical lensarranged in the light-optical beam, which comprises a first lens surface facing the object plane which has two lens surfacesand a through hole, wherein the particle-optical system comprises a beam deflection device, in order to scan a primary particle beamover a part of the sample plane, and wherein the controller is configured to control the beam deflection devicein such a manner that a deflected primary particle beamintersects an optical axisof the particle-optical beam path in a plane which is arranged inside the through hole.

Inspection system

A device and method for analyzing a sample provide for extracting a part to be analyzed from the sample with the aid of a previously generated opening in the sample. The part to be analyzed is examined in greater detail with the aid of a particle beam. For this purpose, the sample is placed in the opening or on a sample holder.

Charged particle beam analysis while part of a sample to be analyzed remains in a generated opening of the sample

A particle beam device includes a movable carrier element with at least one receiving element for receiving a specimen and in which the receiving element is situated on the carrier element. In various embodiments, the receiving element may be situated removably on the carrier element and/or multiple receiving elements may be situated on the carrier element in such a way that a movement of the carrier element causes a movement of the multiple receiving elements in the same spatial direction or around the same axis. The carrier element may be movable in three spatial directions situated perpendicular to one another and rotatable around a first axis which is parallel to an optical axis of the particle beam device and around a second axis which is situated perpendicular to the optical axis. A method for using the particle beam device in connection with specimen study and preparation is also disclosed.

Particle beam device and method for use in a particle beam device

A device and method for analyzing an organic sample provide high spatial resolution. A focused ion beam is directed onto the organic sample. Fragments detached from the sample are examined using mass spectroscopy.

Device and method for analyzing an organic sample

A device and method for analyzing a sample, in particular a sample which contains low-density materials, is provided. Ions of a predefined mass and/or a predefined elementary charge are selected from a plurality of ions. The selected ions are directed onto the sample for sample preparation. An electron beam is then directed onto the prepared sample and a spatial distribution of scattered electrons is measured.

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Heidenheim, Germany

Ulrike Zeile