Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Carl Zeiss Laser Optics Gmbh

Carl Zeiss Semiconductor Manufacturing Technologies Ag

Carl Zelss Smt Ag

Ulrich Weber

Jens Kugler

Hubert Holderer

Alexander Kohl

Bernhard Gellrich

Armin Schoeppach

Johannes Lippert

Wolfgang Hummel

Jochen Weber

Thorsten Rassel

Karl-Eugen Aubele

Erich Merz

Klaus Rief

Raoul Reiner

Markus Neumaier

Juergen Fischer

Michael Muehlbeyer

Stefan Schoengart

Bernhard Geuppert

Stefan Xalter

Franz Sorg

Stefan Hembacher

Willi Anderl

Baerbel Trossbach

Toralf Gruner

Yim-Bun Patrick Kwan

Aksel Goehnermeier

Ulrich Loering

Holger Muenz

Dirk Schaffer

Guido Limbach

Dirk Hellweg

Markus Bauer

Jeffrey Erxmeyer

Johannes Kraus

Michel Le Maire

Michael Schall

Dirk Rexhaeuser

Ingrid Schuster

Nicolai Wengert

Peter Meyer

Christoph Zaczek

Johannes Rau

Jochen Becker

Winfried M Kaiser

Martin Weiser

Peter Deufel

Willi Heintel

Michael Brehm

Andreas Frommeyer

Stephan Back

Baerbel Schwaer

Harald Kirchner

Wolfgang Merkel

Erwin Gaber

Reiner Garreis

Michael Mühlbeyer

Hartmut Muenker

Jens Ullmann

Christian Zengerling

Chris Reed

Dragos Pariza

Mike Meehan

Wolfgang Keller

Sabine Hafenrichter

Henry Wegert

Hans-Jürgen Scherle

Fraser G Morrison

Jürgen Fischer

Stefan Schöngart

Bärbel Trossbach

Aksel Göhnermeier

Armin SCHÖPPACH

Reiner Raoul

A projection exposure apparatus for semiconductor lithography has a connecting element for connecting a component of the apparatus to a supporting cooling structure of the apparatus. The connecting element has a receiving region for receiving the component, and the connecting element has a foot region for connecting the connecting element to the supporting cooling structure. At least one joint is arranged between the receiving and foot regions, and at least one heat conducting element is arranged between the receiving and foot regions. The heat conducting element is soft in the actuation direction of the joint and has a stiffness perpendicularly to the actuation direction of the joint that is at least twice as large as in the actuation direction of the joint.

Projection lighting system for semiconductor lithography with an improved heat transfer

A beam reverser module for an optical power amplifier of a laser arrangement comprises at least one reflecting surface for receiving an incoming laser beam propagating in a first direction and reflecting the incoming laser beam into a second direction different from the first direction, wherein the at least one reflecting surface is a highly reflecting surface of at least one mirror.

Beam reverser module and optical power amplifier having such a beam reverser module

An optical element module includes an optical element unit and a support structure. The optical element module includes an optical element. The support structure includes a support device and a contact device connected to the support device. A surface of the contact device contacts a surface of the optical element unit and exerts a holding force on the optical element unit along a holding force direction.

Optical element module with minimized parasitic loads

An optical assembly () includes an optical element (), a mount () configured to hold the optical element (), and a plurality of fastening elements () with fastening areas () configured to fasten the optical element () to the mount (). The fastening elements () bridge an interstice () between the optical element () and the mount (), and a purge device () produces at least one purge gas flow () in the region of the optical element () such that the purge gas flow flows around the fastening areas () of the fastening elements ().

Optical assembly, projection system, metrology system and EUV lithography apparatus

The disclosure provides a positioning unit for an optical element in a microlithographic projection exposure installation having a first connecting area for connection to the optical element, and having a second connecting area for connection to an object in the vicinity of the optical element.

Positioning unit and apparatus for adjustment of an optical element

An actuator includes a housing, a movable part, and an advancing unit that is at least temporarily connected to the movable part. The advancing unit includes a deformation unit and a deformer configured to deform the deformation unit with a vector component perpendicular to an effective direction of the actuator so that a total length of the deformation unit changes in the effective direction of the actuator as a result of the deformation. The movable part is configured to move in the effective direction of the actuator upon a removal of the vector component on the deformation unit and the deformation unit is disposed along the effective direction of the actuator upon the removal of the vector component on the deformation unit.

Actuators and microlithography projection exposure systems and methods using the same

Support elements for an optical element and a method for supporting an optical element are disclosed. The disclosure can be used in connection with arbitrary optical apparatuses or optical imaging methods. In particular, the disclosure can be used in connection with the microlithography employed in the manufacture of microelectronic circuits.

Support elements for an optical element

The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.

Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations

An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Imaging device in a projection exposure facility

Growing community of inventors

Ulm, Germany

Ulrich Weber