Asml Netherlands B.v.

Carl Zeiss Smt Gmbh

Ulrich Schönhoff

Markus Hauf

Bastiaan Stephanus Hendricus Jansen

Roan Marinus Westerhof

Adrianus Josephus Petrus Van Engelen

Hubertus Luberta Hagenaars

A lithographic apparatus having a reference body and a positioning system, the positioning system including a main body; a reaction body; an actuator; and a controller. The main body is moveable relative to the reference body along a path in a first direction and a second opposite direction. The reaction body is moveable relative to the main body along a further path in the first and second directions and is moveably connected to the reference body to be moveable relative to the reference body in the first and second directions. The controller provides a first and a second signal to the actuator. The actuator is arranged between the main body and the reaction body to accelerate the main body in the first direction and to accelerate the reaction body in the second direction under control of the first signal, and to accelerate the main body in the second direction and to accelerate the reaction body in the first direction under control of the second signal. The controller determines when the reaction body moves in the second direction and to provide the second signal after the first signal to the actuator when the reaction body moves in the second direction along the further path.

Lithographic apparatus, positioning system for use in a lithographic apparatus and method

A control method is provided for controlling a heating of a thermal optical element, the thermal optical element having a matrix of heater elements. The method includes stabilizing a nominal temperature of the thermal optical element with a feedback loop to control the heating of heater elements; providing a desired temperature profile of the thermal optical element by a set point signal; determining a feedforward control of the heater elements from the set point signal; and forwardly feeding an output of the feedforward control into the feedback loop.

Lithographic apparatus and thermal optical manipulator control method

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Ulm, Germany

Ulrich Schönhoff