Olin Microelectronic Chemicals, Inc.

Nitrochemie Wimmis Ag

Ciba Specialty Chemicals Corporation

Ocg Microelectronic Materials, Inc.

Ulrich Schaedeli

Manfred Hofmann

Eric Tinguely

Carl-Lorenz Mertesdorf

Pasquale Alfred Falcigno

Beat Vogelsanger

Kurt Ryf

Patrice Bujard

Norbert Muenzel

Arnold Grubenmann

Bruno Ossola

Hanspeter Andres

Dominik Antenen

Peter Zoss

Attila Vamos

The propulsion system for the acceleration of projectiles is based on nitrocellulose and contains a crystalline energy carrier on a nitramine base and an inert plasticizing additive. The nitramine compound contains a structural element of the general chemical structure formula R&#x2014;N&#x2014;NO, where R is a residual. The nitramine compound is present in a concentration in the range from 1 to 35% by weight, in particular in the range from 5 to 25% by weight. The nitramine compound is preferably RDX. The inert plasticizing additive is a water-insoluble polyoxo compound, if necessary in combination with a substance containing carboxyl groups. In layers near the surface an increased concentration can be present. The inert plasticizing additive is present in a concentration of 1 to 5% by weight.

Propulsion system for the acceleration of projectiles

The method for producing a propellant powder (TLP) with a layered grain structure starts with a green powder, which is impregnated in a watery emulsion with an energetic plasticizer and a polymeric deterrent. Propellant powders (TLP) can be produced in industrial quantities by avoiding the dangerous direct introduction of a blasting oil. The propellant powders (TLP) produced in this way have similar characteristics and a similar structure as the known propellant powders (TLP).

Method for producing a functional, high-energetic material

A microbead comprising at least one thermoplastic polymers having distributed one or more compounds which are pigment precursors, the melting temperature of the lowest-melting polymer of the microbead being at least higher than the lowest temperature required to transform all pigment precursors in the microbead into the respective pigments.

Microbeads consisting of a pigmented polymeric material and process for preparing them

A radiation sensitive composition comprising (a) a terpolymer containing 20 to 70 mole percent of an acid-labile repeating unit, 3 to 40 mole percent of an acrylic or acrylonitrile based repeating unit and a repeating unit containing silicon side-chains and (b) a photo-acid generator. The silicon content of terpolymer is 7 to 20 weight percent. The composition is used primarily in the formulation of multilayer positive operating photoresists.

Radiation sensitive compositions of terpolymers containing organosilicon

A terpolymer containing 20 to 70 mole percent of an acid labile repeating unit, 3 to 40 mole percent of an acrylonitrile based repeating unit and a repeating unit containing silicon side chains. The silicon side chain repeating unit is provided in sufficient amounts so that the terpolymer silicon content is 7 to 20 weight percent. The terpolymer is used primarily in the formulation of multilayer positive operating photoresists.

Terpolymers containing organosilicon side chains

A terpolymer containing 20 to 70 mole percent of an acid labile repeating unit, 3 to 40 mole percent of an acrylic acid or acrylonitrile based repeating unit and a repeating unit containing silicon side chains. The silicon side chain repeating unit is provided in sufficient amounts so that the terpolymer silicon content is 7 to 20 weight percent. The terpolymer is used primarily in the formulation of multilayer positive operating photoresists.

Photoresist compositions are described, which are sufficiently transparent in the solvent-free state for radiation of a wavelength of approximately 193 nm, and which contain nonaromatic chemical groups, which can be converted into groups with aromatic structural elements (latent aromatic groups) under process conditions, for which an image structure comprised of the resist material is not disrupted. A preferred component with latent aromatic groups is bicyclo�3.2.2!nona-6,8-dien-3-one Resist coatings, which are produced with these compositions, show a stability in plasma etching, which is comparable with the stability of conventional resists based on phenolic resins.

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Plasselb, Switzerland

Ulrich Schaedeli