Ciba-geigy Corporation

Ciba Specialty Chemicals Corporation

Ciba-geigy Ag

Arch Specialty Chemicals, Inc.

Ocg Microelectronics, Inc.

Qcg Microelectronics

Ulrich Schadeli

Abul Iqbal

Zhimin Hao

John S Zambounis

Eric Tinguely

Veronique Hall-Goulle

Norbert Munzel

Heinz Wolleb

Gerardus De Keyzer

Manfred Hofmann

Norbert Muenzel

Arnold Grubenmann

Henri Dubas

The invention relates to a color-pigmented high molecular weight organic material structured from a radiation-sensitive precursor by irradiation, the pigmentation of which material consists of extremely fine particles, at least 80 mol % of the pigmentation consisting of a pigment of the class diketopyrrolopyrrole, dioxazine, isoindoline, isoindolinone, disazo condensation yellow or benzimidazolonazo, each containing at least one --NHCO-- group, and, where appropriate, a second pigment of the class diketopyrrolopyrrole, dioxazine, isoindoline, isoindolinone, benzimidazolonazo, disazo or phthalocyanine, and, when the structure of the main pigment is point-symmetrical, the two pigments being present in a balanced molar ratio of from 1:1 to 7:3. Those materials are used preferably in the form of thin layers which are built up in patterns in one or more layers on a transparent substrate and can be used, for example, as optical color filters.

Highly transparent, color-pigmented high molecular weight material

Photoresist compositions are described, which are sufficiently transparent in the solvent-free state for radiation of a wavelength of approximately 193 nm, and which contain nonaromatic chemical groups, which can be converted into groups with aromatic structural elements (latent aromatic groups) under process conditions, for which an image structure comprised of the resist material is not disrupted. A preferred component with latent aromatic groups is bicyclo[3.2.2]nona-6,8-dien-3-one. Resist coatings, which are produced with these compositions, show a stability in plasma etching, which is comparable with the stability of conventional resists based on phenolic resins.

Wet-chemical, developable, etch-stable photoresist for UV radiation with

Compositions for making structured color images comprising

Compositions for making structured color images and application thereof

This invention relates to a black-pigmented high molecular weight organic material which is structured from a radiation-sensitive precursor by irradiation, the pigmentation of which material consists of coloured organic pigments, at least one of which is in latent form before irradiation. This material is preferably used as a thin layer which is built up in the form of patterns on a transparent substrate and which can be used, for example, as black matrix for optical colour filters. This invention also relates to a process for the preparation of this material as well as to novel soluble derivatives of yellow disazo condensation pigments which can be used in this process.

Black-pigmented structured high molecular weight material

Compositions for making structured color images comprising (a) a soluble pigment precursor which can be transformed to an insoluble pigment by means of chemical, thermal, photolytic or radiation-induced method, and (b) a binder polymer or prepolymer, or a positive or negative resist-type resin which can be structured by crosslinking, polymerization or depolymerization by applying heat or electromagnetic irradiation. The compositions can be applied to optical and thermal recording, printing, and the production of color filters for Liquid Crystal Displays, with high accuracy, high transparency and high stability.

Polymers having a molecular weight (weight average) M.sub.w from 10.sup.3 to 10.sup.6, comprising recurring structural units of the formulae (I), (IIa) and (IIb) ##STR1## in which R.sub.1 is hydrogen or methyl, Y is a direct bond or a divalent radical of the formula (III) ##STR2## in which Z is a C.sub.1 -C.sub.6 alkylene group bound to the phenyl nucleus,

Positive photoresist having improved processing properties

Non-polymeric compounds which contain at least one aromatic ring system carrying one or more one or more tetrahydropyranyloxy substituents of formula I ##STR1## wherein R.sub.1 is hydrogen, halogen, alkyl, cycloalkyl, aryl, alkoxy or aryloxy,

Acid labile solution inhibitors and positive- and negative-acting

Copolymers having a molecular weight (Mw) of from 10.sup.3 to 10.sup.6, measured by gel-permeation chromatography, that are crosslinkable by acid catalysis and that consist of

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Plasselb, Switzerland

Ulrich Schadeli