Carl Zeiss Smt Gmbh

Carl-Zeiss-Smt Ag

Carl-Zeiss-Stiftung

Carl Zeiss Laser Optics Gmbh

Ulrich Bingel

Willi Anderl

Tilman Schwertner

Jens Kugler

Hubert Holderer

Bernhard Gellrich

Armin Schoeppach

Joachim Hartjes

Holger Muenz

Dirk Schaffer

Guido Limbach

Julian Kaller

Wilhelm Egle

Markus Bauer

Gerd Klose

Gennady Fedosenko

Stefan Wiesner

Leonid Gorkhover

Claudia Ekstein

Hans-Juergen Scherle

Thomas Neidhardt

Michael Widmann

Wolfgang Hafner

Frits Zernike

Hans-Joachim Trefz

Guenter Albrecht

Bernhard Geuppert

Frank Melzer

Johannes Rau

Willi Heintel

Boaz Pnini-Mittler

Harald Kirchner

Uwe W Hamm

Hagen Federau

Josef Distl

Ansgar Freitag

Johnannes Rau

Nicolas Schmidts

Holger Münz

The disclosure provides a method that includes filling a cavity in a substrate with a second material, wherein the substrate includes a first material. The method also includes using galvanic and/or chemical deposition of a third material to apply an overcoating to a first surface of the substrate in a region of the cavity. The method further includes removing the second material from the cavity. In addition, the method includes, before or after removing the second material from the cavity, applying a reflective layer to the overcoating. The disclosure also provides related optical articles and systems.

Method for producing a reflective optical element, reflective optical element, and use of a reflective optical element

An optical element unit including a first optical element module and a sealing arrangement is disclosed. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially prevents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.

Optical element unit for exposure processes

A method and a device for the material-fit connection of an optical element to a frame are disclosed.

Method and device for connecting an optical element to a frame

An illumination optical system for EUV microlithography is used to direct an illumination light beam from a radiation source to an object field. At least one EUV mirror has a reflective face with a nonplanar mirror topography for forming the illumination light beam. The EUV mirror has at least one EUV attenuator arranged in front of it. The attenuator face which faces the reflective face of the EUV mirror has an attenuator topography which is designed to complement the mirror topography such that at least sections of the attenuator face are arranged at a constant interval from the reflective face. The result is an illumination optical system in which it is possible to correct unwanted variations in illumination parameters, for example an illumination intensity distribution or an illumination angle distribution, over the object field with as few unwanted radiation losses as possible.

EUV microlithography illumination optical system and EUV attenuator for same

An optical element unit includes a first optical element module and a sealing arrangement. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially pre-vents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.

Optical element unit for exposure processes having sealing element

There is provided an optical module for microlithography. The optical module includes an optical element and a retaining device for holding the optical element. The optical element has (a) a main extension plane, in which it defines a radial direction R and a circumferential direction U, and (b) a free optical diameter and an overrun in the region of its outer periphery. The retaining device contacts the optical element in the region of the overrun, and is formed and/or contacts the optical element in such a manner that the overrun ratio, calculated from the overrun related to a minimum overrun necessary for the production of the optical element, is at most 1.5.

Optical module with minimized overrun of the optical element

An optical component comprises at least one optically effective optical element which heats up when irradiated with light, and at least one holding element for the at least one optical element for holding the at least one optical element in a carrier structure, wherein the at least one optical element is connected to the at least one holding element in heat conducting fashion, and wherein the at least one holding element is at least partially provided with an active cooling system for carrying off heat from the at least one optical element. Additionally or alternatively, a temperature control device is provided which controls the temperature of at least a part of the mount of the optical element.

Optical component having an improved transient thermal behavior and method for improving the transient thermal behavior of an optical component

In a method of connecting a multiplicity of optical elements () to a basic body (), in particular for producing a faceted mirror (), for example for beam mixing and field imaging for an EUV lighting system, the individual optical elements () are positioned on the basic body () and subsequently connected to one another by an galvanoplastic process. Alternatively, the multiplicity of optical elements are aligned on an auxiliary structure () and the optical elements () are subsequently made to grow up galvanoplastically on their rear sides, forming a supporting structure () as the basic body.

Method of connecting a multiplicity of optical elements to a basic body

A method for reducing the contamination of at least one optical component ( ) contained in the beam guidance space ( ) and held by a frame ( ) defining the beam guidance space and a corresponding optical beam guidance system. The surfaces of the frame bordering on the beam guidance space are at least partially coated with a degassing barrier layer ( ) that preferably does not increase reflectivity. The method and system have use, for example, in lithography irradiation systems working with UV light.

Optical beam guidance system and method for preventing contamination of optical components contained therein

An optical mounting for an optical component includes an inner, preferably multi-part, portion that abuts the optical component and an outer frame, which are connected together by a plurality of spring hinge beams. The spring hinge beams and other portions of the optical mounting are produced galvanoplastically.

Galvanoplastic optical mounting

Growing community of inventors

Michelfeld, Germany

Ulrich Bingel