Carl Zeiss Smt Gmbh

Carl Zeiss Multisem Gmbh

Ulrich Bihr

Jan Horn

Christof Riedesel

Markus Holz

Yanko Sarov

Erik Essers

Markus Deguenther

Dirk Zeidler

Udo Dinger

Stefan Schubert

Joerg Jacobi

Arne Thoma

Ralf Lenke

Georgo Metalidis

Andy Zott

Jörg Jacobi

Georg Kurij

Stefan Tuerk

Oscar Noordman

Stefan TÜRK

A method of operating a multi-beam particle beam system includes: generating a multiplicity of particle beams such that they each pass through multipole elements that are either intact or defective; focusing the particle beams in a predetermined plane; determining excitations for the deflection elements of the multipole elements; exciting the deflection elements of the multipole elements that are intact with the determined excitations; modifying the determined excitations for the deflection elements of the multipole elements that are defective; and exciting the deflection elements of the defective multipole elements with the modified excitations. Modifying the determined excitations includes adding corrective excitations to the determined excitations. The corrective excitations are the same for all deflection elements of the defective multipole element.

Multi-beam particle beam system and method for operating same

An image sensor for a position sensor apparatus for ascertaining a position of at least one mirror of a lithography apparatus includes: a plurality of integrated optical waveguides; a plurality of incoupling areas; a multiplexer apparatus; and an image reconstruction apparatus.

Image sensor, position sensor device, lithography system, and method for operating an image sensor

A multi-beam particle beam system includes a multi-aperture plate having a multiplicity of apertures. During operation, one particle beam of the plurality of particle beams passes through each of the apertures. A multiplicity of electrodes are insulated from the second multi-aperture plate to influence the particle beam passing through the aperture. A voltage supply system for the electrodes includes: a signal a generator to generate a serial sequence of digital signals; a D/A converter to convert the digital signals into a sequence of voltages between an output of the D/A converter and the multi-aperture plate; and a controllable changeover system, which feeds the sequence of voltages successively to different electrodes.

Multi-beam particle beam system

An apparatus, for example a lithography apparatus or a multi-mirror system, includes comprises a radiation source for generating radiation, a plurality of optical components for guiding the radiation in the apparatus, a plurality of actuator/sensor devices for the optical components, and a drive device for driving the actuator/sensor devices.

Apparatus and method for operating an apparatus

The disclosure provides a sensor arrangement for sensing a position of an optical element in a lithography system. The sensor arrangement includes: a first capacitive sensor device having a position-dependent variable first sensor capacitance that can be sensed using a first excitation signal; a second capacitive sensor device having a position-dependent variable second sensor capacitance that can be sensed using a second excitation signal; and a control device configured to produce the first and second excitation signals so that charges present on a parasitic capacitance associable with the first sensor device are at least partially compensated for by charges that are present on a parasitic capacitance associable with the second sensor device via a signal path outside the first and/or the second excitation signal path.

Sensor arrangement for a lithography system, lithography system, and method for operating a lithography system

A lithography apparatus includes a radiation source configured to produce radiation having a repetition frequency. The lithography apparatus also includes an optical component configured to guide the radiation within the lithography apparatus. The lithography apparatus further includes an actuator device configured to displace the optical component. In addition, the lithography apparatus includes a measurement device configured to determine a position of the optical component via a measurement signal having a measurement signal frequency. The measurement signal frequency is unequal to the repetition frequency, and the measurement signal frequency is unequal to integer multiples of the repetition frequency.

Lithography apparatus and method for operating a lithography apparatus

A multi-mirror array including displaceable mirror elements includes a passive electric damping mechanism for damping disturbances of the displacement positions of the mirror elements.

Multi-mirror array

Growing community of inventors

Kirchheim/Dirgenheim, Germany

Ulrich Bihr