Universitat Konstanz

Other

University of Massachusetts

Ullrich Steiner

Thomas P Russell

Thomas Thurn-Albrecht

Jurgen Mlynek

Erik Sch&auml;ffer

Stefan Walheim

J&uuml;rgen Mlynek

Erik Schaffer

Stefan Eggert

A method for forming a patterned film on a substrate, the method including: providing a first flowable medium on the substrate and a second flowable medium on the first flowable medium, the first and second flowable media having different dielectric properties and defining an interface there between; applying an electric field to the interface for a time sufficient to produce a structure in the first flowable medium along the interface: and hardening the structure in the first flowable medium to form the patterned film.

Methods and apparatus for forming submicron patterns on films

The invention relates to a method for producing an element comprising a substrate and at least one anti-reflection coating with pores. The dimensions of the anti-reflection coating are below the wavelength of visible light or the neighboring spectral ranges. The invention also relates to an element produced according to this method with at least one anti-reflection coating, for example optical lenses, mirrors or other optical components. The optical anti-reflection coating of these elements is essentially improved.

Process for producing antireflection coatings

A method for forming a patterned film on a substrate, the method including: providing a first flowable medium on the substrate and a second flowable medium on the first flowable medium, the first and second flowable media having different dielectric properties and defining an interface there between; applying an electric field to the interface for a time sufficient to produce a structure in the first flowable medium along the interface; and hardening the structure in the first flowable medium to form the patterned film.

Growing community of inventors

Groningen, Netherlands

Ullrich Steiner