Ionautics Ab

Plasmadvance Ab

Ulf Helmersson

Nils Brenning

Daniel Lundin

Sebastian Ekeroth

Daniel Soderstrom

Daniel SÖDERSTRÖM

A method () for monitoring process conditions in a plasma PVD process as well as a method () for controlling a plasma PVD process are disclosed. The methods are performed in an apparatus () configured therefore. In accordance with the methods, an oscillating voltage signal is applied to a target (), arranged in the apparatus (), by means of a radio frequency generator). The response from the applied oscillating voltage signal is recorded by means of a radio frequency sensor (). Based on the recorded response, information regarding at least one plasma process condition is derived. A computer program and a computer-readable medium are also disclosed.

Method for monitoring process conditions of, and method for controlling, a plasma PVD process

A process for producing magnetic nanowires of high quality and a good production yield is disclosed. The process comprises sputtering a target of a magnetic material using a plasma, growing nanoparticles from the sputtered matter to magnetic nanoparticles and collecting the magnetic nanoparticles on a substrate in the form of nanowires.

Nanowires and process for their production

A high production rate plasma sputtering process for producing particles having a size of 10 &#x3bc;m or less is disclosed. The process causes ionization of at least a part of the sputtered target atoms and is performed at such parameters that the pick-up probability of ionized sputtered target atoms on the surface of grains is high.

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Brokind, Sweden

Ulf Helmersson