Vistec Electron Beam Gmbh

Leica Microsystems Lithography Gmbh

Leica Microststems Lithography Gmbh

Ulf-Carsten Kirschstein

Stefan Risse

Thomas Peschel

Gerd Harnisch

Gerhard Schubert

Christoph Schenk

René Bauer

Michael Boehm

Christian Jackel

Christoph Damm

Volker Guyenot

Gerhard Kalkowski

Erik Beckert

Christoph Schaeffel

Torsten Gramsch

Johannes Zentner

Eugen Saffert

Andrew Hoffmann

Michael Böhm

Christoph Dr Schenk

Stefan Dr Risse

Thomas Dr Peschel

A proposed aerostatic bearing arrangement for moving a device on a base structure, particularly in a vacuum environment, has at least one aerostatic bearing element comprising a bearing body having a load-carrying zone and a suction area. An electrostatic preloading unit having at least one electrode is associated with the at least one aerostatic bearing element, and a voltage can be applied to the electrode in such a way that a force component is generated in direction of the surface normal of the bearing body of the aerostatic bearing element.

Aerostatic bearing arrangement and associated electrostatic preloading unit, particularly for vacuum application

A table system for vacuum application has a base plate and a moving table guided by aerostatic bearing units. The bearing units () are connected to supply lines and suction lines for supplying and extracting the gas required for the operation of the bearing units and are provided in each instance with a sealing system having at least one stage and comprising suction channel and sealing gap for sealing relative to the vacuum. The table system is characterized in that the aerostatic bearing units () are constructed at least partially as swivel joints, and a push rod () which is actuated by a drive () for guiding the moving table laterally is connected to the rotating part () of each swivel joint, and in that the push rods () are hollow and constitute a component part of the suction lines for extracting the operating gas.

Aerostatically guided table system for vacuum application

A table for vacuum application which is guided by aerostatic bearing elements, having a fixedly mounted supporting structure and a tabletop which is displaceable in x-direction and y-direction with respect to the fixedly mounted supporting structure by means of slides. The slides are provided with the aerostatic bearing elements for guiding, these aerostatic bearing elements being connected to feed lines for supplying the gas required for the operation of the gas bearings and suction lines for removing this gas. The suction lines comprise at least one variable-length line arrangement having a first pipe member and a second pipe member which penetrate one inside the other without contacting, at least one sealing gap being provided between the pipe members.

Table guided by aerostatic bearing elements for vacuum application

The invention refers to an arrangement for positioning substrates, in particular for positioning wafers, within a device that is provided for exposure of the substrates and/or for measurement on the substrates by means of radiation under high-vacuum conditions. The following are provided according to the present invention: a retention system ( ), displaceable on a linear guidance system ( ), for receiving the substrate, the guidance direction of the linear guidance system ( ) being oriented parallel or substantially parallel to the Y coordinate of an X, Y, Z spatial coordinate system; drives for limited modification of the inclination of the guidance direction relative to the Y coordinate; drives for limited rotation of the linear guidance system ( ), including the retention system ( ), about the guidance direction; and drives for parallel displacement of the linear guidance system ( ), including the retention system ( ), in the direction of the X coordinate, the Y coordinate, and/or the Z coordinate.

Six-axis positioning system having a zero-magnetic-field space

System for receiving and retaining a substrate

The present invention provides for a device for holding a substrate in an exposure system. In the exposure system, the substrate is positioned on a table movable in the X and Y coordinates of an X, Y plane, and the exposure system provides a metering assembly between a table surface and the substrate to adjust the distance and to align the substrate in relation to an exposure optics, from where a corpuscular radiation is directed right-angled onto a substrate surface, corresponding to the Z coordinate. The device for holding the substrate includes two mounting plates aligned parallel to the X, Y plane, adjusted upon the table in a direction to the exposure optics and with different distances to the table surface, the first mounting plate of which being directly connected to the table. The second mounting plate is connected with the first mounting plate through at least one holding device, and has a bearing plane for the substrate being designed on that side of the second mounting plate turned to the exposure optics.

Holding device for a substrate

Growing community of inventors

Jena, Germany

Ulf-Carsten Kirschstein