Hitachi High-tech Corporation

Uki Ikeda

Shunsuke Mizutani

Makoto Suzuki

Shahedul Hoque

Yoshifumi Sekiguchi

Shin Imamura

Makoto Sakakibara

Daisuke Bizen

A charged particle beam apparatus covering a wide range of detection angles of charged particles emitted from a sample includes an objective lens for converging charged particle beams emitted from a charged particle source and a detector for detecting charged particles emitted from a sample. The objective lens includes inner and outer magnetic paths which are formed so as to enclose a coil. A first inner magnetic path is disposed at a position opposite to an optical axis of the charged particle beams. A second inner magnetic path, formed at a slant with respect to the optical axis of the charged particle beams, includes a leading end. A detection surface of the detector is disposed at the outer side from a virtual straight line that passes through the leading end and that is parallel to the optical axis of the charged particle beams.

Charged particle beam apparatus

A charged particle beam apparatus using a light guide that improves light utilization efficiency includes a detector including a scintillator for emitting light when a charged particle is incident, a light receiving element, and a light guide for guiding the light from the scintillator to the light receiving element. The light guide includes: an incident surface that faces a light emitting surface of the scintillator and to which the light emitted by the scintillator is incident; an emitting surface that is configured to emit light; and a reflecting surface that is inclined with respect to the incident surface so that the light from the incident surface is reflected toward the emitting surface. The emitting surface is smaller than the incident surface. A slope surface is provided between the incident surface and the emitting surface, faces the reflecting surface, and is inclined with respect to the incident surface.

The purpose of the present invention is to provide a charged-particle beam apparatus capable of performing various types of signal discriminations according to the shape and the size of a sample. The present invention proposes a charged-particle beam apparatus for irradiating a sample disposed in a vacuum vessel with a charged particle beam. The charged-particle beam apparatus is provided with: a first light-generating surface for generating light on the basis of the collision of charged particles released from the sample; a light-guiding member for guiding the generated light to the outside of the vacuum vessel while maintaining the generation distribution of the light generated at the first light-generating surface; a photodetector for detecting the light guided by the light-guiding member to the outside of the vacuum vessel; and a light-transmission restricting member for restricting transmission of the light guided by the light-guiding member between the photodetector and the light-guiding member.

Charged-particle beam apparatus

The present invention provides a charged particle beam apparatus that covers a wide range of detection angles of charged particles emitted from a sample. Accordingly, the present invention proposes a charged particle beam apparatus that is provided with an objective lens for converging charged particle beams emitted from a charged particle source, and a detector for detecting charged particles emitted from a sample, wherein: the objective lens includes an inner magnetic path and an outer magnetic path which are formed so as to enclose a coil; the inner magnetic path comprises a first inner magnetic path disposed at a position opposite to an optical axis of the charged particle beams and a second inner magnetic path which is formed at a slant with respect to the optical axis of the charged particle beams and which includes a leading end of the magnetic path; and a detection surface of the detector is disposed at the outer side from a virtual straight line that passes through the leading end of the magnetic path and that is parallel to the optical axis of the charged particle beams.

The present disclosure relates to a pattern measuring method to appropriately measure a height and a depth of a pattern having a high aspect ratio. The method includes measuring a width between a first pattern and another pattern formed on a wafer; calculating a value regarding an azimuth angle of a signal emitted from the wafer; and calculating height information from a portion between the first pattern and the other pattern to an upper portion of a pattern based on the measured width between the first pattern and the other pattern, the value regarding the azimuth angle, the value regarding an elevation angle, and relationship information thereof.

Growing community of inventors

Tokyo, Japan

Uki Ikeda