Robert Boschgmbh

Udo Bischof

Markus Lutz

Burkhard Kuhlmann

Reinhard Neul

Jochen Franz

Joerg Hauer

Wolfram Bauer

Christian Doering

Rainer Willig

Udo-Martin Gomez

Karsten Funk

Michael Offenberg

Michael Fehrenbach

Gerhard Wucher

Andreas Thomae

Siegbert Goetz

Jens Frey

Johannes Classen

Christoph Lang

Horst Muenzel

Dieter Maurer

Franz Laermer

Frank Fischer

Wilhelm Frey

Silvia Kronmueller

Thorsten Pannek

Ulf Wilhelm

Eckhard Graf

Lutz Mueller

Holger Hoefer

Lars Metzger

Axel Grosse

Volker Schmitz

Ralf Hausner

Nicholas Buchan

Udo Gomez

Burhard Kuhlmann

An integrated component having a substrate, the substrate having a cavity which surrounds a mechanical structure. The cavity is filled by a fluid of a specific composition under a specific pressure, and the mechanical properties of the mechanical structure are influenced by the fluid.

Method for sealing an opening

A rotation rate sensor having a substrate and a Coriolis element is proposed, the Coriolis element being situated above a surface of a substrate; the Coriolis element being able to be induced to vibrate in parallel to a first axis (X); an excursion of the Coriolis element being detectable, based on a Coriolis force in a second axis (Y), which is provided to be essentially perpendicular to the first axis (X); the first and second axes (X, Y) being provided parallel to the surface of the substrate, wherein force-conveying means are provided, the means being provided to convey a dynamic force effect between the substrate and the Coriolis element.

Rotation rate sensor

A rotational rate sensor having a substrate and a Coriolis element is proposed, the Coriolis element being situated over a surface of a substrate; a driving arrangement being provided, by which the Coriolis element is induced to vibrations parallel to a first axis; a detection arrangement being provided, by which an excursion of the Coriolis elements is detectable on the basis of a Coriolis force in a second axis that is provided to be essentially perpendicular to the first axis; the first and second axis being parallel to the surface of the substrate; sensor elements that are designated to be at least partially movable with respect to the substrate being provided; a force-conveying arrangement being provided; the force-conveying arrangement being provided to convey a static force effect between the substrate and at least one of the sensor elements.

Rotational rate sensor

A component having a surface micromechanical structure containing both movable elements and immovable elements, and a method of manufacturing same are described. The surface micromechanical structure of the component is produced in a functional layer, which is connected to a substrate via at least one electrically non-conductive first insulation layer and at least one first sacrificial layer. The movable elements of the surface micromechanical structure are exposed by removing the first sacrificial layer. The first insulation layer is made of a material which is not substantially attacked by the process of removing the first sacrificial layer. Thus the removal of the sacrificial layer may be limited in a design-controlled manner. At the same time, a reliable electrical insulation of the surface micromechanical structure with respect to the substrate of the component and a reliable mechanical fastening of the immovable elements of the surface micromechanical structure to the substrate are ensured.

Micromechanical component

An exemplary embodiment of the present invention creates a micromechanical rotational rate sensor having a first Coriolis mass element and a second Coriolis mass element which may be situated over a surface of a substrate. An exemplary embodiment of a micromechanical rotational rate sensor may have an activating device by which the first Coriolis mass element and the second Coriolis mass element are able to have vibrations activated along a first axis. An exemplary embodiment of a micromechanical rotational rate sensor may have a detection device by which deflections of the first Coriolis mass elements and of the second Coriolis element are able to be detected along a second axis, which is perpendicular to the first axis, on the basis of a correspondingly acting Coriolis force. The first axis and second axis may run parallel to the surface of the substrate. The detecting device may have a first detection mass device and a second detection mass device. The centers of gravity of the first Coriolis mass element, the second Coriolis mass element, the first detection mass device and the second detection mass device may coincide at a common mass center of gravity when they are at rest.

Micromechanical rotational rate sensor

A method of manufacturing a micromechanical component has the steps: providing a substrate having a front side and a back side; structuring the front side of the substrate; at least partially covering the structured front side of the substrate with a protective layer containing germanium; structuring the back of the substrate; and at least partially removing the protective layer containing germanium from the structured front side of the substrate.

Method of manufacturing a micromechanical component

A yaw-rate sensor is proposed having a first and a second Coriolis element ( ) which are arranged side-by-side above a surface ( ) of a substrate. The Coriolis elements ( ) are induced to oscillate parallel to a first axis. Due to a Coriolis force, the Coriolis elements ( ) are deflected in a second axis which is perpendicular to the first axis. The first and second Coriolis elements ( ) are coupled by a spring ( ) which is designed to be yielding in the first and in the second axis. Thus, the frequencies of the oscillations in the two axes are developed differently for the in-phase and antiphase oscillation.

Rotation speed sensor

A yaw-rate sensor including a first and a second Coriolis element that are arranged side-by-side above a surface of a substrate. The Coriolis elements are induced to oscillate parallel to a first axis Y. Due to a Coriolis force, the Coriolis elements are deflected in a second axis X which is perpendicular to the first axis Y. The oscillations of the first and second Coriolis elements occur in phase opposition to each other on paths which, without the effect of a Coriolis force, are two straight lines parallel to each other.

An rate-of-rotation sensor having a Coriolis element, which is arranged over a surface of a substrate, is described. The Coriolis element is induced to oscillate in parallel to a first axis. In response to a Coriolis force, the Coriolis element is deflected in a second axis, which is perpendicular to the first axis. A proof element is provided to prove the deflection.

Rotational speed sensor

A method for manufacturing a micromechanical component, in particular, a surface-micromechanical yaw sensor, includes the following steps: providing a substrate having a front side and a back side; forming a micromechanical pattern on the front side; applying a protective layer on the micromechanical pattern on the front side; forming a micromechanical pattern on the back side, a resting on the micromechanical pattern on the front side taking place at least temporarily; removing the protective layer on the front side; and optionally further processing the micromechanical pattern on the front side and/or the micromechanical pattern on the back side.

Method for manufacturing a micromechanical component

A manufacturing method for a micromechanical component, and in particular for a micromechanical rotation rate sensor, which has a supporting first layer, an insulating second layer that is arranged on the first layer, and a conductive third layer that is arranged on the second layer. The method includes the following steps: provide the second layer, in the form of patterned first and second insulation regions, on the first layer; provide a first protective layer on an edge region of the first insulation regions and on a corresponding boundary region of the first layer; provide the third layer on the structure resulting from the previous steps; pattern out a structure of conductor paths running on the first insulation regions, and a functional structure of the micromechanical component above the second insulation regions, from the third layer; and remove the second layer in the second insulation regions, the second layer being protected in the first insulation regions by the first protective layer in such a way that it is essentially not removed there.

Manufacturing method for micromechanical component

A bonding pad structure, in particular for a micromechanical sensor, includes a substrate, an electrically insulating sacrificial layer provided on the substrate, a patterned conductor path layer buried in the sacrificial layer, a contact hole provided in the sacrificial layer, and a bonding pad base, composed of an electrically conductive material. The bonding pad base has a first region extending over the sacrificial layer, and a second layer in contact with the conductor path region and extending through the contact hole. A protective layer is provided at least temporarily on the sacrificial layer in a specific region beneath and around the bonding pad base to prevent underetching of the sacrificial layer beneath the bonding pad base during etching of the sacrificial layer in such a way that the substrate and/or the conductor path is exposed.

Bonding pad structure and method for manufacturing the bonding pad

A rate-of-rotation sensor includes a three-layer system. The rate-of-rotation sensor and the conductor traces are patterned out of the third layer. The conductor traces are electrically insulated (isolated) by cutouts from other regions of the third layer and by a second electrically insulating layer from a first layer. Thus, a simple electrical contacting (configuration) is achieved that is patterned out of a three-layer system. Since the same etching process is used for the first and the third layer, an especially efficient manufacturing is possible.

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Wannweil, Germany

Udo Bischof