Hitachi High-tech Corporation

U Oh

Minoru Yamazaki

Yuko Sasaki

The present invention provides a charged particle beam device with which optimal parameters for the device can be effectively derived in a short time period. This charged particle beam device comprises: an electron gun () that irradiates a sample () with an electron beam (); an image processing unit () that acquires an image of the sample () from a signal () generated by the sample () due to the electron beam (); a database () that holds correspondence between a first parameter that is an optical condition, a second parameter that is a value pertaining to device performance, and a third parameter that is information pertaining to the device configuration, and stores a plurality of analysis values and measurement values; and a learning machine () that searches the database () and derives a first parameter that satisfies a target value of the second parameter.

Growing community of inventors

Tokyo, Japan

U Oh