Au Optronics Corporation

Tzu-Min Yang

Ta-Wen Liao

Hsiang-Chih Hsiao

Chi-Hung Yang

Shan-Fang Chen

Chung-Yuan Liao

Ya-Ping Chang

An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.

Method of forming patterned layer, method of forming patterned photoresist layer, and active device array substrate

Exposure apparatus, method of forming patterned layer, method of forming patterned photoresist layer, active device array substrate and patterned layer

Growing community of inventors

Changhua County, Taiwan

Tzu-Min Yang