Macronix International Co., Ltd.

Macronix Internationalco., Ltd.

Tzu-Hsuan Hsu

Hang-Ting Lue

Chao-I Wu

Ming-Hsiu Lee

Yen-Hao Shih

Erh-Kun Lai

Teng-Hao Yeh

Kuang-Yeu Hsieh

Ming-Chang Kuo

Chia-Wei Wu

Hsiang-Lan Lung

Ya-Chin King

Po-Kai Hsu

Chia-Hua Ho

Chih-Chang Hsieh

Jung-Yu Hsieh

Shih-Chih Lee

Chen-Jun Wu

Chun-Hsiung Hung

Ken-Hui Chen

Kuang Yeu Hsieh

Wei-Chen Chen

Yung-Chun Li

Sheng-Chih Lai

Ming-Hsiang Hsueh

Ming-Hsin Lee

Chen-Huan Chen

A memory device for CIM, applicable to a 3D AND-type flash memory, includes a memory array, input word line pairs, and a signal processing circuit. The memory array includes first and second pairs of memory cells. Each first pair of memory cells includes a first memory cell set coupled to a first GBL and a second memory cell set coupled to a second GBL. Each second pair of memory cells includes a third memory cell set coupled to the first GBL and a fourth memory cell set coupled to the second GBL. Each input word line pair includes a first input word line coupled to the first and the second memory cell sets, and a second input word line coupled to the third and the fourth memory cell sets s. The signal processing circuit is coupled to the first and second global bit lines.

Memory device for computing in-memory

A memory device, such as a 3D AND flash memory, includes a memory cell block, a word line driver, and a plurality of bit line switches. The word line driver has a plurality of complementary transistor pairs for respectively generating a plurality of word line signals for a plurality of word lines. Substrates of a first transistor and a second transistor of each of the complementary transistor pairs respectively receive a first voltage and a second voltage. Each of the bit line switches includes a third transistor. A substrate of the third transistor receives a third voltage. The first voltage, the second voltage, and the third voltage are constant static voltages during a soft program operation and a soft program verify operation.

Memory device for increasing speed of soft-program operation

A three-dimensional memory device, such as 3D AND Flash memory device, includes a first page buffer, a second page buffer, a sense amplifier, a first path selector, and a second path selector. The first page buffer and the second page buffer are respectively configured to temporarily store a first write-in data and a second write-in data. The first path selector couples the sense amplifier or the first page buffer to a first global bit line according to a first control signal. The second path selector couples the sense amplifier or the second page buffer to a second global bit line according to a second control signal.

Three-dimensional memory device

A method for performing an operation in a memory device is provided. The method includes the following steps. An erasing operation is performed on one selected word line of the memory device to ensure that a plurality of first cells to be programed and a plurality of second cells to be erased connected to the selected word line have threshold voltages lower than a first predetermined level. A programming operation is performed on the selected word line, such that the first cells are suffered a first program bias and the second cells are suffered a second program bias which is lower than the first program bias.

Method for performing operation in memory device

Provided is an operation method for a memory device, the operation method comprising: performing an erase operation; performing a verify-read operation on a memory cell to generate a cell current, the memory cell including a first transistor and a second transistor; checking whether the cell current is lower than a first cell current threshold; when the cell current is not lower than the first cell current threshold, increasing a memory gate voltage until the cell current is lower than the first cell current threshold, wherein the memory gate voltage is applied to the first transistor; fixing the memory gate voltage and increasing a drain voltage; checking whether the cell current is lower than a second cell current threshold; and if the cell current is not lower than the second cell current threshold, increasing the drain voltage until the cell current is lower than the second cell current threshold.

Operation method for memory device

An in-memory computation device including a memory array, p&#xd7;q analog to digital converters (ADCs) and a ladder adder is provided. The memory array is divided into p&#xd7;q memory tiles, where p and q are positive integers larger than 1. Each of the memory tiles has a plurality local bit lines coupled to a global bit line respectively through a plurality of bit line selection switches. The bit line selection switches are turned on or cur off according to a plurality of control signals. The memory array receives a plurality of input signals. The ADCs are respectively coupled to a plurality of global bit lines of the memory tiles. The ADCs respectively convert electrical signals on the global bit lines to generate a plurality of sub-output signals. The ladder adder is coupled to the ADCs, and performs an addition operation on the sub-output signals to generate a calculation result.

In-memory computation device

A two-sided, staged programming operation is applied to a memory having first and second stacks of memory cells C() and C(), i being the physical level of a cell. The staged programming operation includes applying a preliminary program stage S, an intermediate program stage S, and a final program stage Sto memory cells in the first and second stacks. In a programming order the final program stage Sis applied to memory cells in the first and second stacks at each level (i) for which the intermediate program stage Shas already been applied to the memory cells in any neighboring levels (levels i+1 and i&#x2212;1). The intermediate program stage Sis applied only to memory cells for which the preliminary program stage Shas already been applied to the cells in any neighboring levels (levels i+1 and i&#x2212;1).

3D memory with staged-level multibit programming

A data erase method of a three dimensional (3D) memory device comprising the following steps. First, in a first phase of an erase operation, a first voltage is applied to a first semiconductor channel of the semiconductor channels to erase data stored in the memory cells defined on the first semiconductor channel and a second voltage is applied to a second semiconductor channel of the semiconductor channels, wherein the second semiconductor channel is adjacent to the first semiconductor channel. Then, in a second phase of the erase operation, the second voltage is applied to the first semiconductor channel and the first voltage is applied to the second semiconductor channel.

Three dimensional memory device and data erase method thereof

A semiconductor structure and a method for manufacturing the same are disclosed. The semiconductor structure includes a first electrode layer, a second electrode layer and a dielectric layer between the first electrode layer and the second electrode layer. A width of the second electrode layer becomes larger in a direction away from the dielectric layer.

Memory device and method for manufacturing the same

A vertical channel transistor structure is provided. The structure includes a substrate, a channel, a cap layer, a charge trapping layer, a source and a drain. The channel is formed in a fin-shaped structure protruding from the substrate. The cap layer is deposited on the fin-shaped structure. The cap layer and the fin-shaped structure have substantially the same width. The charge trapping layer is deposited on the cap layer and on two vertical surfaces of the fin-shaped structure. The gate is deposited on the charge trapping layer and on two vertical surfaces of the fin-shaped structure. The source and the drain are respectively positioned on two sides of the fin-shaped structure and opposite the gate.

Vertical channel transistor structure and manufacturing method thereof

An integrated circuit of an array of nonvolatile memory cells has a dielectric stack layer over the substrate, and implanted regions in the substrate under the dielectric stack layer. The dielectric stack layer is continuous over a planar region, that includes locations of the dielectric stack layer that store nonvolatile data, such that these locations are accessed by word lines/bit lines.

Nonvolatile memory array with continuous charge storage dielectric stack

A non-volatile memory cell comprising a substrate, a charge-trapping layer, a control gate, a first conductive state of source and drain, a lightly doped region and a second conductive state of pocket-doped region. The charge-trapping layer and the control gate are disposed over the substrate. A dielectric layer is disposed between the substrate, the charge-trapping layer and the control gate. The source and drain are disposed in the substrate on each side of the charge-trapping layer. The lightly doped region is disposed on the substrate surface between the source and the charge-trapping layer. The pocket-doped region is disposed within the substrate between the drain and the charge-trapping layer. Because there are asymmetrical configuration and different doped conductive states of implant structures, the programming speed of the memory cell is increased, the neighboring cell disturb issue is prevented, and the area occupation of the bit line selection transistor is reduced.

Non-volatile memory and non-volatile memory cell having asymmetrical doped structure

A vertical channel memory including a substrate, a channel, a multi-layer structure, a gate, a first terminal and a second terminal is provided. The channel protrudes from the substrate and has a top surface and two vertical surfaces. The multi-layer structure is disposed on the two vertical surfaces of the channel. The gate straddling multi-layer structure is positioned above the two vertical surfaces of the channel. The first terminal and the second terminal are respectively positioned at two sides of the channel opposing to the gate.

Vertical channel memory and manufacturing method thereof and operating method using the same

A non-volatile memory cell may include a semiconductor substrate; a source region in a portion of the substrate; a drain region within a portion of the substrate; a well region within a portion of the substrate. The memory cell may further include a first carrier tunneling layer over the substrate; a charge storage layer over the first carrier tunneling layer; a second carrier tunneling layer over the charge storage layer; and a conductive control gate over the second carrier tunneling layer. Specifically, the drain region is spaced apart from the source region, and the well region may surround at least a portion of the source and drain regions. In one example, the second carrier tunneling layer provides hole tunneling during an erasing operation and may include at least one dielectric layer.

Non-volatile memory device having a nitride-oxide dielectric layer

A method of performing an operation on a flash memory cell device, used when a gate coupling ratio between a floating gate and a control gate of less than 0.4. A potential is required to be applied across the control gate. Electrons are either injected to the floating gate from the control gate or ejected from the floating gate to the control gate. The operation associated with the injection or the ejection is determined by the nature of a silicon channel provided in the device. Devices using a bulk-tied FinFET-like structure are particularly suited to this method. The method is also particularly suited for use on cells in a NAND array.

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Chiayi County, Taiwan

Tzu-Hsuan Hsu