Industrial Technology Research Institute

Tzu-Hao Yu

Tzu-Yang Ting

Chien-Hsun Chu

Yun-Yi Huang

Chieh-Wei Feng

Min-Hsiung Liang

Shao-An Yan

Jui-Wen Yang

Yu-Jhen Yang

Hsin-Cheng Lai

An exercise sensing method, an exercise sensing apparatus and an exercise sensing system are provided. The exercise sensing system includes a computing device, a storage device and at least one biophysical quantity sensor disposed on at least one muscle portion of a user. In the method, a current muscle strength of the muscle portion when the user performs an exercise is monitored by the biophysical quantity sensor. An exercise history of the user is accessed to obtain a muscle strength reference value of the muscle portion when the user previously performed the exercise. The current muscle strength is compared with the muscle strength reference value so as to adjust an exercise intensity of the exercise.

Exercise sensing method, apparatus and system

A weight training method, a weight training apparatus and a weight training system are provided. In the method, a weight of a load of a user operating the weight training apparatus is detected by a load sensor, a motion of the load is detected by an activity sensor, and thereby an operation power of the weight training apparatus is calculated. A force applied by the muscle portion when the user operates the weight training apparatus is detected by at least one biophysical quantity sensor disposed on at least one muscle portion of the user and used to calculate an energy power consumed by the user. An exercise efficiency value of the user is calculated by using the energy power and the operation power, and the user is prompted to adjust an operation performed on the weight training apparatus when the exercise efficiency value drops beyond a preset ratio.

Weight training method, apparatus and system

A redistribution structure including a first redistribution layer is provided. The first redistribution layer includes a dielectric layer; at least one conductive structure located in the dielectric layer, wherein the at least one conductive structure has a width L; and at least one dummy structure located adjacent to the at least one conductive structure and located in the dielectric layer, and the at least one dummy structure has a width D, wherein there is a gap width S between the at least one dummy structure and the at least one conductive structure, and a degree of planarization DOP of the first redistribution layer is greater than or equal to 95%, wherein DOP=[1&#x2212;(h/T)]*100%, and h refers to a difference between a highest height and a lowest height of a top surface of the dielectric layer; and T refers to a thickness of the at least one conductive structure.

Redistribution structure and forming method thereof

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Yilan County, Taiwan

Tzu-Hao Yu