E-Phocus, Inc.

Trex Enterprises Corporation

Tzu-Chiang Hsieh

Calvin Chao

Michael Engelmann

Milam Pender

John Arthur Lovberg

Peter J Martin

Kenneth Y Tang

Robert A Fein

Brett Lewis

A high bandwidth, low latency middle-mile core communications network providing low-cost and high-speed communications among the users of the network. Embodiments of the invention include a number of network access points located at a number of spaced apart sites. At least some of these network access points in the network are in communication with each other via millimeter radio links with microwave backup links. In preferred embodiments the millimeter radio links include two millimeter radios, one transmitting in the frequency range of 71-76 GHz and receiving in the frequency range if 81 to 86 GHz and the other radio transmitting in the frequency range of 81-86 GHz and receiving in the frequency range if 71 to 76 GHz.

Circuit switched millimeter wave communication network

A method for wafer-to-wafer bonding of a sensor readout circuitry separately fabricated with a silicon substrate to a photodiode device made of non-silicon materials grown from a separate substrate. In preferred embodiments the non-silicon materials are epitaxially grown on a silicon wafer. The bonding technique of preferred embodiments of the present invention utilizes lithographically pre-fabricated metallic interconnects to connect each of a number of pixel circuits on a readout circuit wafer to each of a corresponding number of pixel photodiodes on a photodiode wafer. The metallic interconnects are extremely small (with widths of about 2 to 4 microns) compared to prior art bump bonds with the solder balls of diameter typically larger than 20 microns. The present invention also provides alignment techniques to assure proper alignment of the interconnects during the bonding step.

Method for manufacturing hybrid image sensors

A MOS or CMOS based active pixel sensor with special sampling features to substantially eliminate clock noise. The sensor includes an array of pixels fabricated in or on a substrate, each pixel defining a charge collection node on which charges generated inside a photodiode region are collected, a charge integration node, at which charges generated in said pixel are integrated to produce pixel signals, a charge sensing node from which reset signals and the pixel signals are sensed. In preferred embodiments the sensor includes a continuous electromagnetic radiation detection structure located above the pixel circuits providing a photodiode region for each pixel. The sensor includes integrated circuit elements adapted to maintain voltage potentials of the charge integration nodes substantially constant during charge integration cycles. The sensor also includes integrated circuit elements having electrical capacitance adapted to store charges providing an electrical potential at the charge integration node. In preferred embodiments this is a pinned diode.

CDS capable sensor with photon sensing layer on active pixel circuit

A MOS or CMOS based active pixel sensor designed for operation with zero or close to zero potential across the pixel photodiodes to minimize or eliminate dark current. In preferred embodiments the pixel photodiodes are produced with a continuous pin or nip photodiode layer laid down over pixel electrodes of the sensor. In this preferred embodiment, the voltage potential across the pixel photodiode structures is maintained constant and close to zero, preferably less than 1.0 volts. This preferred embodiment enables the photodiode to be operated at a constant bias condition during the charge detection cycle. Setting this constant bias condition close to zero (near 'short circuit' condition) assures that dark current is substantially zero.

CMOS sensor with electrodes across photodetectors at approximately equal potential

A MOS or CMOS sensor for high performance imaging in broad spectral ranges including portions of the infrared spectral band. These broad spectral ranges may also include portions or all of the visible spectrum, therefore the sensor has both daylight and night vision capabilities. The sensor includes a continuous multi-layer photodiode structure on a many pixel MOS or CMOS readout array where the photodiode structure is chosen to include responses in the near infrared spectral ranges. A preferred embodiment incorporates a microcrystalline copper indium diselenide/cadmium sulfide photodiode structure on a CMOS readout array. An alternate preferred embodiment incorporates a microcrystalline silicon germanium photodiode structure on a CMOS readout array. Each of these embodiments provides night vision with image performance that greatly surpasses the GEN III night vision technology in terms of enhanced sensitivity, pixel size and pixel count. Further advantages of the invention include low electrical bias voltages, low power consumption, compact packaging, and radiation hardness. In special preferred embodiments CMOS stitching technology is used to provide multi-million pixel focal plane array sensors. One embodiments of the invention made without stitching is a two-million pixel sensor. Other preferred embodiments available using stitching techniques include sensors with 250 million (or more) pixels fabricated on a single wafer. A particular application of these very high pixel count sensors is as a focal plane array for a rapid beam steering telescope in a low earth orbit satellite useful for tracking over a 1500-meter wide track with a resolution of 0.3 meter.

Visible/near infrared image sensor array

An active pixel sensor for producing images from electron-hole producing radiation includes a crystalline semiconductor substrate having an array of electrically conductive diffusion regions, an interlayer dielectric (ILD) layer formed over the crystalline semiconductor substrate and comprising an array of contact electrodes, and an interconnect structure formed over the ILD layer, wherein the interconnect structure includes at least one layer comprising an array of conductive vias. An array of patterned metal pads is formed over the interconnect structure and are electrically connected to an array of charge collecting pixel electrodes. A radiation absorbing structure includes a photoconductive N-I-B-P photodiode layer formed over the interconnect structure, and a surface electrode layer establishes an electrical field across the radiation absorbing structure and between the surface electrode layer and each of the array of charge collecting pixel electrodes. An array measurement circuit measures the charge collected and outputs pixel data defining an image.

Photoconductor-on-active-pixel (POAP) sensor utilizing a multi-layered radiation absorbing structure

A MOS or CMOS sensor with a multi-layer photodiode layer covering an array of active pixel circuits. The multi-layer photodiode layer of each pixel is fabricated as continuous layers of charge generating material on top of the MOS and/or CMOS pixel circuits so that extremely small pixels are possible with almost 100 percent packing factors. The sensor includes special features to minimize or eliminate pixel to pixel crosstalk. A micro-lens array with a micro-lens positioned above each pixel directs light illuminating the pixel toward the central portion of the pixel and away from its edges. Also, preferably carbon is added to doped amorphous silicon N or P bottom layer of the multi-layer photodiode layer to increase the electrical resistivity in the bottom layer to further discourage crosstalk. In preferred embodiments each of the pixels define a tiny surface area equal to or larger than about 3.24 square microns and smaller than or equal to about 25 square microns. Detailed descriptions are provided for two general types of sensors. The first type has a pixel count of about 0.3 to 1.9 million pixels and are especially suited for sues such as cell phone cameras. The second type with pixel count of between about 1.9 million pixels to more than 5 million pixels is especially suited for high definition television cameras.

MOS or CMOS sensor with micro-lens array

A MOS or CMOS based photoconductor on active pixel image sensor. Thin layers of semi-conductor material, doped to PIN or NIP photoconducting layers, located above MOS and/or CMOS pixel circuits produce an array of layered photodiodes. Positive and negative charges produced in the layered photodiodes are collected and stored as electrical charges in the MOS and/or CMOS pixel circuits. The present invention also provides additional MOS or CMOS circuits for reading out the charges and for converting the charges into images. With the layered photodiode of each pixel fabricated as continuous layers of charge generating material on top of the MOS and/or CMOS pixel circuits, extremely small pixels are possible with almost 100 percent packing factors. MOS and CMOS fabrication techniques permit sensor fabrication at very low costs. In preferred embodiments all of the sensor circuits are incorporated on or in a single crystalline substrate along with the sensor pixel circuits. Techniques are disclosed for tailoring the spectral response of the sensor for particular applications.

Photoconductor on active pixel image sensor

An active pixel sensor. A solid state radiation detection unit may be fabricated using a semiconductor substrate having a plurality of CMOS pixel circuits incorporated into the substrate. An array of pixel circuits includes within each circuit a charge collecting pixel electrode, a charge sensing node, a gate bias transistor for separating the charge collecting pixel electrode and the charge sensing node and for maintaining the pixel electrodes at substantially equal potential, and a pixel capacitor to store charges collected by the charge collecting pixel electrodes. A charge measuring circuit comprising at least one transistor may also be configured with each pixel circuit. The sensor may further include a radiation absorbing layer comprised of photoconductive material, as well as a surface electrode layer comprised of electrically conducting material.

Growing community of inventors

Fremont, CA, United States of America

Tzu-Chiang Hsieh