Vanguard International Semiconductor Singapore Pte. Ltd.

Tze Sheong Neoh

Jia Jie Xia

Bevita Kallupalathinkal Chandran

A MEMS structure may include a substrate, a first metal layer arranged over the substrate, an aluminum nitride layer at least partially arranged over the first metal layer and a second metal layer including one or more patterns arranged over the aluminum nitride layer. The first metal layer may include an electrode area configured for external electrical connection and one or more isolated areas configured to be electrically isolated from the electrode area and further configured to be electrically isolated from external electrical connection. Each pattern of the second metal layer may be arranged to at least partially overlap with one of the isolated area(s) of the first metal layer.

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Singapore, Singapore

Tze Sheong Neoh