Ichor Systems, Inc.

Tyler James Wright

Sean Joseph Penley

Zachariah Ezekiel McIntyre

Matthew Eric Kovacic

Christopher Bryant Davis

Daniel Thomas Mudd

Patti J Mudd

Michael Maeder

Marshall B Grill

Norman L Batchelor, Ii

A gas flow control system for delivering a plurality of gas flows. The gas flow control system has a gas flow path extending from a gas inlet to first and second gas outlets. First and second flow restrictors are operably coupled to the gas flow path. First and second valves are operably coupled to the gas flow path such that when both first and second valves are in a fully open state, flows of gas from the first and second gas outlets are split according to the impedances of the first and second flow restrictors.

Flow control system, method, and apparatus

Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. These apparatuses for controlling gas flow frequently rely on flow restrictors which can provide a known flow impedance of the process gas. In one embodiment, a flow restrictor is disclosed, the flow restrictor constructed of a plurality of layers, one or more of the layers having a flow passage therein that extends from a first aperture at a first end of the flow restrictor to a second aperture at a second end of the flow restrictor.

Laminar flow restrictor and seal for same

Laminar flow restrictor

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Reno, NV, United States of America

Tyler James Wright