Hitachi, Ltd.

Tutomu Tawa

Minori Noguchi

Yukihiro Shibata

Tsuneo Terasawa

Yoshitada Oshida

Hiroshi Furukawa

Makoto Murayama

Shigemi Ishii

A projection exposure apparatus comprises a light source for emitting a light beam for exposure; an illumination optical system comprising optical fiber bundle portion including a plurality of bundled optical fibers having an entrance plane to which a light beam exiting from the exposing light source is incident, and a little optical fiber bundle portion including a plurality of little optical fiber bundles respectively having an outgoing plane; and an projection exposure system for projecting a light beam passing through the illumination optical system and transmitting a mask or a reticle onto an object to be exposed as a pattern image of the mask or the reticle.

Illumination method, illumination apparatus and projection exposure

A deflection yoke assembly positioning device which grasps the opening portion of flared portion of a deflection yoke assembly mounted on the funnel yoke portion of a color cathode-ray tube of a color television receiver in the steps of correction of inclination of the display screen, purity adjustment and convergence alignment. The device positions the deflection yoke assembly in the most desired position on the funnel yoke portion of the cathode-ray tube by causing rotating movement of the deflection yoke assembly around its axis, sliding movement of the deflection yoke assembly in the axial direction of the neck portion of the cathode-ray tube, and vertical and horizontal oscillating movement of the opening portion of the deflection yoke assembly relative to the axis of the neck portion of the cathode-ray tube.

Deflection yoke assembly positioning device

Growing community of inventors

Katsuta, Japan

Tutomu Tawa