Matsushita Electric Industrial Co., Ltd.

Tutomu Nakanishi

Koji Nomura

Keizaburo Kuramasu

Tokumi Kotani

A pyroelectric infrared radiation detector for detecting the intensity of infrared radiation with a pyroelectric element is provided. The pyroelectric infrared radiation detector comprises a substrate made of a single crystal material such as (100) magnesium oxide and an infrared radiation detecting structure which comprises a first electrode disposed on the substrate, a pyroelectric thin film disposed on the first electrode, and a second electrode disposed on the pyroelectric thin film for absorption of infrared radiation. The substrate has a recess provided in the upper surface thereof where the infrared radiation detecting structure is seated. A method of producing the pyroelectric infrared radiation detector comprises a first step of forming a first electrode on one surface of a substrate, a second step of forming a pyroelectric thin film on the first electrode, a third step of forming a second electrode on the pyroelectric thin film, a fourth step of providing etching apertures in the first electrode which are open to the substrate, and a fifth step of providing by wet etching process at least one recess in the surface of the substrate where the first electrode is seated.

Method of producing a pyroelectric infrared radiation detector

A pyroelectric infrared radiation detector for detecting the intensity of infrared radiation with a pyroelectric element. The pyroelectric infrared radiation detector comprises a substrate made of a single crystal material and an infrared radiation detecting structure which comprises a first electrode disposed on the substrate, a pyroelectric thin film disposed on the first electrode, and a second electrode disposed on the pyroelectric thin film for absorption of infrared radiation. The substrate has a recess provided in the upper surface thereof where the infrared radiation detecting structure is seated. A method of producing the pyroelectric infrared radiation detector comprises a first step of forming a first electrode on one surface of a substrate, a second step of forming a pyroelectric thin film on the first electrode, a third step of forming a second electrode on the pyroelectric thin film, a fourth step of providing etching apertures in the first electrode which is open to the substrate, and a fifth step of providing by wet etching process a recess(es) in the surface of the substrate where the first electrode is seated.

Growing community of inventors

Osaka, Japan

Tutomu Nakanishi