Tokyo Electron Limited

Tokyo Electron Yamanashi Limited

Tel Engineering Limited

Tutomu Hiroki

Shoichi Abe

Kiyotaka Akiyama

Tsutomu Satoyoshi

An apparatus according to the present invention includes a cassette in which a plurality of substrates are stored, a contact guide member provided to face a side surface of the cassette, and pressing end surfaces of substrates stored in the cassette, an alignment device for moving the contact guide member to approach the cassette, and pressing the contact guide member against the end surfaces of the substrates in the cassette, thereby aligning the substrates all at one pressing time, and detectors, provided for the alignment device at positions corresponding to spaces of substrates held in the cassette, in the same or multiple number of the spaces for holding substrates, for detecting whether or not a substrate is present in each of the spaces for holding the substrates of the cassette.

Apparatus for detecting and aligning a substrate

A vacuum-process system comprising plural vacuum-process chambers in which substrates are processed in decompressed atmosphere, a first load lock chamber communicated with each of the vacuum-process chambers and exhausted to substantially same decompressed atmosphere as in the vacuum-process chambers, a second load lock chamber communicated with the first one and exhausted to substantially same atmosphere as in the first load lock chamber, a first carrier arranged in the first load lock chamber to carry the substrate between the first and the second load lock chamber, a first buffer assembly arranged in the first load lock chamber to temporarily hold plural substrates thereon, a second buffer assembly arranged in the second load lock chamber to temporarily hold plural substrates thereon, an assembly in the second load lock chamber to position single or plural substrates relative to their passage, and a second carrier arranged in normal atmosphere to carry plural substrates into and out of the second load lock chamber.

Multi-chamber system

A vacuum processing apparatus in which LCD substrates are processed includes three process chambers. Each of the process chambers is connected to a first load lock chamber through a gate valve. A second load lock chamber is also connected to the first load lock chamber through a gate valve. The second load lock chamber is opposed to a carrier member, which is arranged in the atmosphere, through a gate valve. A carrier arm is arranged in the first load lock chamber to carry the substrates between each of the process chambers and the second load lock chamber. A buffer rack for supporting two substrates thereon and positioners for aligning the two substrates, which are supported on the buffer rack, simultaneously are arranged in the second load lock chamber.

Vacuum processing apparatus

A vacuum processing apparatus for LCD substrates comprises three process chambers. Each of these process chambers is connected to a first load lock chamber via a gate. A second load lock chamber is connected to the first load lock chamber via another gate. A transfer member arranged under the air atmosphere is located to face the second load lock chamber. A retractable arm for transferring a substrate between each of the process chambers and the second load lock chamber is arranged within the first load lock chamber. Also arranged within the first load lock chamber is a storing member for temporarily storing the substrate. These storing member and the arm are supported by a rotatable base. The storing member has four different height levels for supporting the substrate, and is moved in a vertical direction.

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Yamanashi-ken, Japan

Tutomu Hiroki