Ciba Specialty Chemicals Corporation

Basf Se Corporation

Base Se

Igm Group B.v.

Tunja Jung

Kurt Dietliker

Gisèle Baudin

Katia Studer

Rinaldo Hüsler

Katharina Misteli

Peter Simmendinger

Peter Nesvadba

Urs Lehmann

Andreas Valet

Peter Murer

Gabriele Baisch

Reinhold Öhrlein

Andreas Mühlebach

Kai-Uwe Schöning

Reinhard Sommerlade

Antoine Carroy

Jonathan Rogers

André Fuchs

Lothar Alexander Engelbrecht

Didier Bauer

Rachel Kohli Steck

Lucienne Bugnon

François Rime

Karin Powell

Martin Müller

Caroline Lordelot

Johannes Benkhoff

Jemima Schmidt

Thomas Vogel

Ljubomir Misev

Laurent Michau

Thomas Giesenberg

Paul Brown

Thomas Horni

Gis&egrave;le Baudin

Gis&eacute;le Baudin

Rinaldo Huesler

Lother Alexander Engelbrecht

Rinaldo HÜSLER

Compounds of the Formula (I), (II) and (III) wherein Ar is for example phenylene, biphenyleneor naphthylene, all of which are unsubstituted or substituted by C-C-alkyl, C-C-alkenyl, CN, OR, SR, CH 2OR, COOR, CONRRor halogen; R, R, Rand Rindependently of one another other are hydrogen or C-C-alkyl; Rand Rtogether and Rand Rtogether form a C-C-alkylene bridge which is unsubstituted or substituted by one ore more C-C-alkyl; Ris hydrogen or C-C-alkyl; Rand Rindependently of one another for example are hydrogen, phenyl, C-C-alkyl, C-C-alkyl which is interrupted by one or more O; n is 1-10; X is O, S or NR; A and Aare suitable linking groups; are suitable as photolatent bases. 

Photoactivable nitrogen bases

Compounds of the Formula (I), (II) and (III) wherein Aris is for example phenylene, biphenylene or naphthylene, all of which are unsubstituted or substituted by C-C-alkyl, C-C-alkenyl, CN, OR, SR, CH2OR, COOR, CONRRor halogen; R, R, Rand Rindependently of one another other are hydrogen or C-C-alkyl; Rand Rtogether and Rand Rtogether form a C-C-alkylene bridge which is unsubstituted or substituted by one or more C-C-alkyl; Ris hydrogen or C-C-alkyl; Rand Rindependently of one another for example are hydrogen, phenyl, C-C-alkyl, C-C-alkyl which is interrupted by one or more O; n is 1-10; X is O, S or NR; A and Aare suitable linking groups; are suitable as photolatent bases. 

Compounds of the Formula (I) wherein x is an integer from 1-4; p is an integer from 1-3; q is an integer from 0-3; Ar is phenyl, naphthyl, anthryl or phenanthryl each of which optionally is substituted by one or more Cl, CN, OR, C-Calkenyl or C-Calkyl which optionally is substituted by one or more OR, COOR or halogen; Rif x is 1, is OR, O&#x2014;X, NRR, C-Calkyl optionally substituted by one or more COOR, or is C-Calkyl interrupted by one ore more O, or is C-Calkenyl or phenyl-C-Calkyl; Rif x is 2, is for example C-Calkylene; Rif x is 3, is for example a tri-valent radical; Rif x is 4, is for example a tetravalent radical; Rand Rare hydrogen or C-Calkyl, or Rand Rtogether are O, C-Calkylene or CH&#x2550;CH; Ris C-Calkyl; R, R, R, R, Rand Rare for example hydrogen or C-Calkyl; and X is a x-valent cationic counter ion; are in particular suitable as photoinitiators for the curing with UV-A light (320-450 nm). 

Alpha-hydroxyketones

The present invention discloses functionalized nanoparticles comprising on the surface a covalently bound radical of the formula (I) wherein the nanoparticles are SiO, AlOor mixed SiOand AlOnanoparticles, and wherein the general symbols are as defined in claim. These functionalized nanoparticles are for example useful as stabilizers and/or compatibilizers in organic materials, or as photoinitiators in pre-polymeric or pre-crosslinking formulations, or as reinforcer of coatings and improver of scratch resistance in coating compositions for surfaces. 

Functionalized nanoparticles

The present invention provides organometallic latent catalyst compounds, which are suitable as catalysts in polyaddition or polycondensation reactions which are catalysed by a Lewis acid type catalyst, in particular for the crosslinking of a blocked or unblocked isocyanate or isothiocyanate component with a polyol or polythiolto form a polyurethane (PU).

Photolatent catalysts based on organometallic compounds

Base-polymerizable or base-crosslinkable compositions comprising select bicyclic amines with benzylic substitution undergo photochemically induced, base-catalysed reactions upon photochemical conversion of the benzylically substituted amine to an amidine derivative.

The present application provides a composition showing a color change depending on the absorbed radiation-dose, comprising (a) an acid responsive colorant; (b) a photolatent acid; characterized in that (b) is a sulfonyloxime ester compound; and its use as a radiation dose indicator.

UV-dosis indicators

The Application relates to a method of curing various polymerisable compositions, comprising a suitable photoinitiator, the curing being effected by means of a plasma in plasma discharge chamber.

Curing of coating induced by plasma

The invention relates to novel N-substituted imides and polymerizable compositions comprising these N-substituted imides. The invention further relates to the use of N-substituted imides as polymerization initiators. The imides are compounds of the formula (I) and (II) wherein n is 1 or 2; m is 1 or 2; Rand Rare each, independently of one another, hydrogen, C-Calkyl, C-C-alkenyl C-Caryl, aralkyl, C-Ccycloalkyl, each of which may be substituted by halogen, C-C-alkyl, hydroxy, C-Calkoxy, carbonyl, C-Calkoxycarbonyl; or Rand Rtogether with the adjacent &#x2014;CO&#x2014;N&#x2014;CO&#x2014; group may form a monocyclic, bicyclic or polycyclic ring, said ring having up to 50 non hydrogen atoms and wherein said ring may contain the structural element (formula III) more than once; Rif n is 1, is C-Calkyl, C-Caryl, aralkyl, C-Ccycloalkyl, ORor SR, NRR; wherein Rif n is 2, is C-Calkylene, C-Carylene, xylylene Rand R, correspond to Rand R; Rif n is 1, is hydrogen, C-Calkyl, C-Caryl, aralkyl, C-Ccycloalkyl, NRR; wherein Rif n is 2, is C-Calkylene, C-Carylene, xylylene; Ris hydrogen, C-Calkyl, C-Caryl, aralkyl, C-Ccycloalkyl, each of which may be substituted by halogen, C-C-alkyl, hydroxy, C-Calkoxy, carbonyl, C-Calkoxy-carbonyl; or Rand Ror Rand Rform together with the N-atom attached to Ra 5-6 membered ring, optionally interrupted by &#x2014;NH&#x2014;, &#x2014;N(C-Calkyl)-, &#x2014;O&#x2014; and/or S-atoms. 

N-substituted imides as polymerization initiators

The invention relates to novel photoinitators of formulae (I), (II), (III), (IV), (V) and (VI) wherein Rand Rare each independently of the other C-Calkyl; C-Calkyl substituted by OH, C-Calkoxy, &#x2014;COO(C-Calkyl), (C-Calkyl)-COO&#x2014;, &#x2014;CN, benzyl, phenyl or by &#x2014;N(R)(R); C-Calkerlyl, benzyl, &#x2014;CH&#x2014;CH&#x2014;(C-Calkyl) or phenyl; or Rand Rtogether are unbranched or branched C-Calkylene or C-C-oxa- or -azaalkylene; R, R, Rand Rare each independently of the others hydrogen, C-Calkyl, C-Calkenyl, benzyl, &#x2014;CH&#x2014;CH&#x2014;(C-Calkyl) or phenyl; Rand Rtogether and/or Rand Rtogether are unbranched or branched C-Calkylene; A is CI, Br, &#x2014;O&#x2014;R, &#x2014;N(R)(R) or &#x2014;S&#x2014;R, A' is &#x2014;O&#x2014;, &#x2014;NH&#x2014; or &#x2014;NR&#x2014;; A&#x2033; is CI, Br, &#x2014;O&#x2014;R, &#x2014;N(R)(R) or &#x2014;S&#x2014;Ror hydrogen, X is &#x2014;O&#x2014;Ror &#x2014;N(R)(R), n is an integer from 1 to 10, preferably an integer from 1 to 4, especially 1, 2 or 3; Ris a linker; Ris a bivalent C-Calkylele radical. 

Photoinitiators

Compounds of the formula I R7&#x2033;N&#x2014;R6 RS&#x2014;C,N&#x2014;R4 H C, R'/I R, 3 R 2 (I) in which R, is an aromatic or heteroaromatic radical which is capable of absorbing light in the wave-length range from 200 nm to 650 nm and which is unsubstituted or substituted one or more times by C,&#x2014;C,8alkyl, C2-C,ealkenyl, C2-C,8alkynyl, C,&#x2014;C,ehaloalkyl, NO2, NR,OR, CN, OR,2, SR,2, C(O)R,3, C(O)OR,4, halogen or a radical of the formula II R&#x2dc;&#x2014;N&#x2032; R6 1 R5-C,N.R4 H I C&#x2014;R3 I R2 (II) and which on absorption brings about a photoelimination which leads to the generation of an amidine group, R2 and R3 independently of one another are hydrogen, C,&#x2014;C,ealkyl or phenyl which is unsubstituted or is substituted one or more times by C,&#x2014;C,8alkyl, CN, OR,2, SR,2, halogen or C,&#x2014;C,ehaloalkyl; R5 is C,&#x2014;C,ealkyl or NR8R9; R4, R6, R, R8, R9, R,o and R independently of one another are hydrogen or C,&#x2014;C,8alkyl; or R4 and R6 together form a C2-C,2alkylene bridge which is unsubstituted or is substituted by one or more C1-C4alkyl radicals; or R5 and R, independently of R4 and R6, together form a C2-C,2alkylene bridge which is unsubstituted or is substituted by one or more C1-C4alkyl radicals; or, if R5 is a radical NR8R9, R, and R9 together form a C2-C,2alkylene bridge which is unsubstituted or is substituted by one or more C1-C4alkyl radicals; and R,2, R,3 and R,4 independently of one another are hydrogen or C,&#x2014;C,ealkyl; are suitable as photoinitiators for compounds which react under base catalysis.

A process for producing stable, scratch-resistant coatings comprising the preparation of a photocurable formulation containing certain siloxane photoinitiators as surface-active initiators, application of the formulation to a substrate and the curing of the formulation by exposure to electromagnetic radiation with wavelengths from 200 nm into the IR region and prior, simultaneous or subsequent exposure to heat.

Process for producing coatings using surface-active photoinitiators

Compounds of the formula I are suitable photoinitiators which accumulates at the surface of the formulation in which Y is a divalent group C&#x2013;Ccycloalkylene, C&#x2013;Cbicycloalkylene;C&#x2013;Calkylenen-C&#x2013;Ccycloalkylene, C&#x2013;Calkylene-C&#x2013;Cbicycloalkylene orC&#x2013;Calkylene interrupted by one or more non-consecutive C&#x2013;Ccycloalkylene, &#x2014;U&#x2014;C&#x2013;Ccycloalkylene,C&#x2013;Cbicycloalkylene or &#x2014;U&#x2014;C&#x2013;Cbicycloalkylene; C&#x2013;Calkylene interrupted by one or more non-consecutive O and C&#x2013;Ccycloalkylene,&#x2014;U&#x2014;C&#x2013;Ccycloalkylene, C&#x2013;Cbicycloalkylene and/or&#x2014;U&#x2014;C&#x2013;Cbicycloalkylene; 

Surface-active siloxane photoinitiators

The invention relates to a process for preparing organosilicon group containing photoinitiators of the formula (I), wherein m is a number from 1 to 200; q is 0 or 1; A is IN-C(O)&#x2014;O&#x2014;CHR&#x2014;Y&#x2014; or IN-C(O)&#x2014;NH&#x2014;CHR&#x2014;Y&#x2014;; A' is A or R&#x2032;; Rand R&#x2032;, Rand R&#x2032; are C&#x2013;Calkyl or phenyl, or &#x2014;(O)&#x2014;SiRR&#x2032;R; Ris hydrogen or C&#x2013;Calkyl, Y is a divalent group selected from C&#x2013;Calkeylene, C&#x2013;Calkenylene or &#x2014;(CH)&#x2014;O&#x2014;(CH)&#x2014;; and b are each independently of the other a number of 1 to 6; IN is a photolabile functional moiety of the formula (II) or (III), wherein Ris hydrogen or &#x2014;C(O)&#x2014;C(O)&#x2014;OH or &#x2014;C(O)&#x2014;C(O)&#x2014;OC&#x2013;Calkyl and n is 1&#x2013;3; Rand Rare C&#x2013;Calkyl or together are cycloC&#x2013;Calkyl; Ris hydroxy, C&#x2013;Calkoxy or morpholinyl; X is &#x2014;(CH)&#x2014;, &#x2014;(CH)&#x2014;O&#x2014;(CH)&#x2014; or &#x2014;(CH)&#x2014;O&#x2014;CO&#x2014;(CH)&#x2014;; a and b are each independently of the other a number of 1 to 6; whereby the process is characterized in that a photolabile functional moiety containing a carboxy group (IN-COOH) or an alkoxycarbonyl group (IN-CO&#x2014;OC&#x2013;Calkyl) is reacted with a carbinol- or amino terminated organosilicon compound of the formula (IV), wherein m, Rand R&#x2032;, Rand R&#x2032; are as defined above and B is &#x2014;Y&#x2014;CHR&#x2014;OH or &#x2014;Y&#x2014;CHR&#x2014;NH; B&#x2032; is B or R&#x2032;, in the presence of an enzyme which catalyzes the esterification, transesterification or amidation reaction.

Enzymatic process for preparing organosilicon group containing photoinitiators

A process for the production of coatings with scratch-resistant durable surfaces that comprise as photoinitiator (B) in a photocurable formulation at least one surface-active photoinitiator, concentrated at the surface of the formulation, of formula (Ia) or (Ib), wherein Ris a radical of formula (IIa), Ris a radical of formula (IIb)), or Rand Rare naphthyl, anthracyl, phenanthryl or a heterocyclic radical each of which is unsubstituted or substituted; R, R, R, R, R, R, R, R, Rand Rare, for example, each independently of the others hydrogen; A-Y; C&#x2013;Calkyl, halogen or phenyl; Rand Rare, for example, C&#x2013;Calkyl; X is &#x2014;ORor &#x2014;N(R)(R); Ris, for example, hydrogen or C1&#x2013;C4alkyl; R21 and R22 are, for example, hydrogen or C&#x2013;Calkyl; Xis, for example, &#x2014;O&#x2014;; Y is, for example, a single bond or &#x2014;O&#x2014;; Yis, for example, a single bond; and A is, for example, C&#x2013;Calkyl.

Growing community of inventors

Rheinfelden-Herten, Germany

Tunja Jung