Taiwan Semiconductor Manufacturing Comp. Ltd.

Tun Jen Chang

Bao-Ru Young

Tung-Heng Hsieh

An integrated circuit (IC) layout design is received that includes a first circuit cell and a second circuit cell abutted to one another. The first circuit cell contains a first IC component, and the second circuit cell contains a second IC component. A determination is made that a distance between the first IC component and the second IC component is less than a predefined threshold when the first circuit cell and the second circuit cell are abutted together. The IC layout design is revised such that the distance between the first IC component and the second IC component is eliminated in the revised IC layout design.

Revising IC layout design to eliminate gaps between isolation structures

A fuse structure includes first and second transistors where each of the first and the second transistors has a source terminal, a drain terminal, and a gate terminal; a first source/drain contact disposed on the source terminal of the first transistor; a second source/drain contact disposed on the drain terminal of the second transistor; an insulator disposed laterally between the first and the second source/drain contacts; a source/drain contact via disposed on the first source/drain contact; and a program line connected to the source/drain contact via, wherein a width of the insulator is configured such that a programming potential applied across the source/drain contact via and the drain terminal of the second transistor causes the insulator to break down.

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Hsinchu, Taiwan

Tun Jen Chang