Applied Materials, Inc.

Tuerxun Ailihumaer

Srinivas Gandikota

Seshadri Ganguli

Yixiong Yang

Yogesh Sharma

Conformally deposited molybdenum films having reduced resistivity and methods of forming the same are disclosed. The methods include converting an amorphous silicon layer to a metal layer by thermally soaking the amorphous silicon layer comprising silicon atoms in the presence of a metal compound selected from the group consisting of a molybdenum compound and a tungsten compound until at least a portion of the silicon atoms in the amorphous silicon layer are replaced by metal atoms selected from the group consisting of molybdenum atoms and tungsten atoms. The methods include conformally depositing a molybdenum film on the metal layer.

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Santa Clara, CA, United States of America

Tuerxun Ailihumaer