Magnetic Peripherals Inc.

Tuan P Tran

Beat G Keel

Alan G Kracke

Edward L Schwarz

Larry D Zimmerman

Patrick C Darst

Gene P Bonnie

Mara M Koller

A thin film magnetic recording head has a flux path in which during writing magnetic saturation occurs in the throat section of the leading pole rather than in the trailing pole. This keeps the stray magnetic fields generated in the area where the saturation occurs during writing from distorting the just-recorded data pattern in the medium, since the leading pole is spaced sufficiently far from the data pattern as it is created adjacent the trailing pole. Preferably, this is accomplished by making a cross section area of the flux path in the leading pole throat section physically smaller than the minimum cross section area in the remainder of the leading pole or in the trailing pole and is throat section.

Thin film head with reduced cross section in the core for causing

A method and article of manufacture allows great accuracy in machining the edge of a face on a prism to a predetermined position respective a feature carried on the face and formed by deposition of insulating material. The preferred application for this invention is in accurately machining the transducing surface of a disk memory transducer assembly so that the throat height of the thin-film head carried on an end face of the assembly has a precise value.

Machining sensor

A method for use with an article of manufacture allows great accuracy in machining the edge of a face on a prism to a predetermined position respective a feature carried on the face and formed by deposition of insulating material. The preferred application for this invention is in accurately machining the transducing surface of a disk memory transducer assembly so that the throat height of the thin-film head carried on an end face of the assembly has a precise value.

Method for using a machining sensor

A desired feature of deposition material is produced on a substrate by forming an adhesion inhibitor on the substrate in a pattern whose inner edges are adjacent the bounds of the feature being produced. A seedlayer is deposited over the adhesion inhibitor and exposed portions of the substrate, and a mask is formed over the seedlayer adjacent the edges of the adhesion inhibitor, the inner edges of the mask defining the feature being produced. A deposition material is deposited over the exposed seedlayer, and the mask is removed. Unwanted portions of the seedlayer and deposition layer are removed by mechanically lifting off. The adhesion inhibitor serves to inhibit the bonding of the seedlayer to the substrate sufficiently to enable the mechanical lift-off. The adhesion inhibitor is removed, either by lifting off with the seedlayer and deposition layer, or subsequently.

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Bloomington, MN, United States of America

Tuan P Tran