Hitachi-High-Technologies Corporation

Tsuyoshi Umemoto

Youji Takahashi

Tsutomu Iida

Makoto Kashibe

Tadamitsu Kanekiyo

Yasuo Oogoshi

In power supply and a semiconductor making apparatus and a semiconductor fabricating method using the same, an abnormality can be detected when an offset occurs in a part constituting a closed-loop system of high-frequency power supply or dc power supply for a semiconductor making apparatus. Power supply for receiving a power value setting signal to set strength of power and a power on/off instruction to set on or off of outputting of the power interrupts the supply of the power even in a state in which a subsequent power on/off instruction is on if a power sense signal according to a value obtained by sensing the power exceeds a predetermined value when the power on/off instruction is off.

Power supply, a semiconductor making apparatus and a semiconductor wafer fabricating method using the same

A high-frequency power supply apparatus for a plasma generation apparatus having a modulator for generating an intermittent high-frequency output on the basis of a modulation reference signal and a peak value setting signal, the high-frequency power supply apparatus having: a first control loop for comparing the peak value of the intermittent high-frequency output detected by a peak value detector with a preset peak value of the high-frequency output so that the output controller controls the peak value of the high-frequency output to be the preset peak value; and a second control loop for calculating an average value of the intermittent high-frequency output based on the preset peak setting value and a preset duty ratio setting value and generating a modulation reference signal for controlling the modulator on the basis of the average value of the high-frequency output detected by a monitor and the average value of the high-frequency output.

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Yamato, Japan

Tsuyoshi Umemoto