Tokyo Electron Limited

Littelfuse Japan G.k.

Tsuyoshi Takizawa

Takanori Saito

Kenichi Yamaga

Kazuhide Hasebe

Hiroyuki Yamamoto

Tomohisa Shimazu

Arata Tanaka

Yukimasa Saito

Masaaki Iwai

Toshiyuki Makiya

Hisaei Osanai

Manabu Honma

Makoto Nakajima

Toshiya Ikeno

The present invention provides a protection device that can more surely protect an electronic or an electric apparatus even when an inrush current value is large and its magnitude has large dispersion, and that has a recovery property. The protection device of the present invention includes a PTC component; a resistive component; and a first terminal and a second terminal, wherein the first terminal, the PTC component, the resistive component, and the second terminal are electrically connected in series in this order.

Protection device

A protective element including (i) a PTC element having an opening passing through in the thickness direction, and (ii) a first electrode and a second electrode positioned on both main surfaces of the PTC element, the protective element characterized in that the first electrode extends from a main surface of the PTC element over an edge thereof and into the opening wherein the PTC element is not prevented from expanding even when secured by a screw or caulking.

Protection element

The present invention is a thermal processing unit including: a heating-furnace body whose upper end has an opening; a heating unit provided on an inside wall of the heating-furnace body; a reaction container consisting of a single tube contained in the heating-furnace body; a gas-discharging-pipe connecting portion formed at an upper portion of the reaction container; and a first temperature controlling unit provided around the gas-discharging-pipe connecting portion.

Thermal processing unit

A vertical heat processing apparatus includes a process chamber () defining a process field (A) configured to accommodate a plurality of target substrates (W) supported at intervals in a vertical direction. The apparatus further includes a heating furnace () surrounding the process chamber () and including an electric heater (), and an electric blower () configured to send a cooling gas into the heating furnace (). A control section () executes, in order to converge the process field (A) to a target temperature, performing power feeding to the heater () to heat up the process field (A) to a predetermined temperature immediately below the target temperature, and at a time point when the process field (A) reaches the predetermined temperature, decreasing the power feeding to the heater (), and supplying the cooling gas from the blower () to forcibly cool the process field (A).

Vertical heat treatment device and method controlling the same

Thermal treatment apparatus

A thermal processing apparatus includes a reaction vessel into which an object to be processed is conveyed, a furnace body disposed so as to surround the reaction vessel, and a heater disposed in a region surrounding the reaction vessel in the furnace body. The heater includes heating elements, each having a sealing member made of a ceramic material and a linear flexible resistance heat generating member sealed by the sealing member.

Thermal processing apparatus

Growing community of inventors

Hokota, Japan

Tsuyoshi Takizawa