Tomoegawa Paper Co., Inc.

Tsuyoshi Takizawa

Shinichi Takahashi

An infrared ray blocking transparent film which can be very thin and have greater transparency and higher adhesion than that of conventional films; the cost for forming the film can be lower due to the reduced amounts of forming materials used for the infrared ray blocking layer, is disclosed. An infrared ray blocking layer is provided on a surface of a base film, by coating conductive materials including indium tin oxide powder and resin; a hard coat layer is provided on a surface of the infrared ray blocking layer; an adhesive layer is provided on a rear surface of the base film. Since resin employed in the infrared ray blocking layer is UV-curing resin including photo-cationic polymerization initiator, thickness of the layer is reduced, and transparency and adhesion thereof are improved.

Infrared-blocking transparent film

A desensitizing solution for lithographic platemaking which mainly comprises phytic acid or a salt thereof is disclosed, said desensitizing solution containing a polyether polyamine or a derivative thereof represented by formula (I): ##STR1## wherein k, m, x, and y each represent an integer of 1 or more; and R.sub.1 represents a hydrogen atom or C.sub.n H.sub.2n R.sub.2, wherein n is an integer of 1 or more, and R.sub.2 represents a hydrogen atom, an NR.sub.3 R.sub.4 (wherein R.sub.3 and R.sub.4 each represent a hydrogen atom or an alkyl group), a chlorine atom, a fluorine atom, an iodine atom, a bromine atom, a hydroxyl group, a carboxyl group or a carbamoyl group, or a polyamine derivative represented by formula (II): ##STR2## wherein X represents a halogen atom; p and each represent an integer of from 2 to 6; and r represents an integer of from 3 to 2000. The desensitizing solution exhibits satisfactory desensitizing characteristics without causing environmental pollution.

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Shizuoka, Japan

Tsuyoshi Takizawa