Nec Corporation

Kawasaki Jukogyo Kabushiki Kaisha

International Superconductivity Technology Center

Mitsubishi Materials Corporation

Independent Administrative Institution National Institute for Materials Science

Tsuyoshi Takenaka

Katsumi Suzuki

Youichi Enomoto

Shuichi Fujino

Masahito Ban

Toshiharu Ind Admint Inst National Kobayashi

Hiroshi Ind Adm Institution National Harada

Masahiro Sato

Yutaka Ind Adm Institution National Koizumi

Seiya Nitta

A superconductive device manufacturing method is disclosed, which can prevent the characteristic deterioration on the processed surface, reduce the number of process steps, and thereby shorten the manufacturing time. The superconductive device manufacturing method comprises the steps of: forming a YBCO film (301) on a substrate (201); forming a mask pattern (302) on the formed YBCO film (301); and etching the YBCO film (301) by use of the formed mask pattern (302) and a plasma including at least oxygen plasma.

Superconductive device manufacturing method

A superconducting device having a superconducting film measures a characteristic such as its resonance frequency while in an environment having a temperature that is less than or equal to its superconducting transition temperature. A laser then thermally etches the superconducting film on the basis of said measurement in the environment having a temperature that is less than or equal to a superconducting transition temperature.

Method and apparatus for fabricating superconductor device

Growing community of inventors

Himeji, Japan

Tsuyoshi Takenaka