University of Texas System

Tsuyoshi Ogawa

C Grant Willson

B Michael Jacobsson

Michael B Jacobsson

Carlton Grant Willson

Michael W Lin

Daniel J Hellebusch

William K Bell

The present invention describes branched and functionalized siloxanes and methods for making such compounds. The compounds have a variety of uses. One preferred application is as novel planarizing material for lithogaphy, in which case functionalized branched siloxane, such as an epoxy-modified branched siloxane is particularly useful.

Branched siloxanes and methods for synthesis

The present invention describes branched and functionalized siloxanes and methods for making such compounds. The compounds have a variety of uses. One preferred application is as novel planarizing material for lithography, in which case functionalized branched siloxane, such as an epoxy-modified branched siloxane is particularly useful.

An imprint lithography release agent having general formula (1): where Rrepresents H or CH, n is an integer from 1 to 5, and m is an integer from 1 to 40. Fluorinated silazanes of general formula (1) can be used to form a release layer on an imprint lithography template, added to an imprint lithography resist, or both.

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Austin, TX, United States of America

Tsuyoshi Ogawa