Toyota Jidosha Kabushiki Kaisha

Kabushiki Kaisha Toyota Chuo Kenkyusho

Tsuyoshi Nishiwaki

Jun Saito

Masaru Senoo

Shuhei Oki

Kyosuke Miyagi

Takashi Ushijima

Shinya Iwasaki

Atsushi Imai

Takashi Suzuki

Hiroshi Hosokawa

Masayasu Ishiko

Hideki Tojima

Yukihiro Hisanaga

Masakazu Okada

Hidehiro Nakagawa

Sachiko Tanaka

Hirokazu Saito

A method of manufacturing a semiconductor device includes: forming a light absorbing layer on a front surface of a semiconductor substrate or in the semiconductor substrate; forming a high concentration layer, in which an impurity concentration is increased, by implanting impurities into the semiconductor substrate; and heating the high concentration layer so as to activate the impurities in the high concentration layer. The formation of the light absorbing layer and the formation of the high concentration layer are performed such that the light absorbing layer and the high concentration layer at least partially overlap each other. The high concentration layer is heated by irradiating the high concentration layer with light from a front surface side of the semiconductor substrate in the heating of the high concentration layer.

Method of manufacturing semiconductor device

A method of manufacturing a semiconductor device includes: implanting charged particles into a first range and a second range in a semiconductor substrate from at least one of a first surface of the semiconductor substrate and a second surface of the semiconductor substrate located on an opposite side of the first surface so as to increase crystal defect densities in the first range and the second range; implanting n-type impurities into the first range from the first surface so as to make a region amorphous, the region being in the first range and disposed at the first surface; irradiating the first surface with first laser after the implantation of the charged particles and the implantation of the n-type impurities so as to heat the first range and the second range; and crystallizing the region which has been made amorphous in or after the irradiation of the first laser.

A semiconductor device including a semiconductor substrate and an electrode formed from an alloy containing aluminum, silicon and titanium. The silicon content in the electrode is from 0.5 to 1.0% by weight relative to the total weight of the electrode, the titanium content in the electrode is from 0.8 to 3.0% by weight relative to the total weight of the electrode, and the thickness of the electrode is at least 1 &#x3bc;m.

Semiconductor device

An IGBT has an emitter region, a top body region that is formed below the emitter region, a floating region that is formed below the top body region, a bottom body region that is formed below the floating region, a trench, a gate insulating film that covers an inner face of the trench, and a gate electrode that is arranged inside the trench. When a distribution of a concentration of p-type impurities in the top body region and the floating region, which are located below the emitter region, is viewed along a thickness direction of a semiconductor substrate, the concentration of the p-type impurities decreases as a downward distance increases from an upper end of the top body region that is located below the emitter region, and assumes a local minimum value at a predetermined depth in the floating region.

IGBT and method of manufacturing the same

A manufacturing method for a semiconductor device including a drift layer; a body layer contacting a front surface of the drift layer; an emitter layer provided on a portion of a front surface of the body layer and exposed on the front surface of the substrate; a buffer layer contacting a back surface of the drift layer; a collector layer contacting a back surface of the buffer layer and exposed on a back surface of the substrate; and a gate electrode facing, via an insulator, the body layer in an area where the body layer separates the emitter layer from the drift layer, includes preparing a wafer that includes a first layer, and a second layer layered on a back surface of the first layer and having a higher polycrystalline silicon concentration than the first layer, and forming the buffer layer by implanting and diffusing ions in the second layer.

Semiconductor device and manufacturing method of same

The present invention presents a stencil mask in which various surface patterns can be formed, and in which deformation is suppressed when charged particles are introduced. A stencil mask of the present invention is provided with a semiconductor stack. A first penetrating hole corresponding to an ion introducing area is formed in a first semiconductor layer of the semiconductor stack, and second penetrating holes are formed in a second semiconductor layer, these second penetrating holes having a width greater than the width of the first penetrating hole. The first penetrating hole and the second penetrating holes communicate and pass through the semiconductor stack. Beam members extending between adjacent second penetrating holes connect portions of the first semiconductor layer separated by the first penetrating hole.

Stencil masks, method of manufacturing stencil masks, and method of using stencil masks

A semiconductor device having a substrate; an emitter electrode or source electrode formed on the top surface side of the substrate; a gate electrode formed on the top surface side of the substrate; and a collector electrode or drain electrode formed on the bottom surface side of the substrate. The device includes an insulating region formed so as to surround a device-forming region provided on the top surface side of the substrate; and a drift region of the device-forming region, the drift region being in contact with the insulating region, is formed of a semiconductor layer having the same conduction type as that of a channel formed through application of an electric potential to the gate electrode. The gate electrode is a trench gate. An outer peripheral portion of the emitter electrode or source electrode extends in a width of 20 &#x3bc;m or more over the top surface of the insulating region. The insulating region includes, in its interior, a dielectric region having a relative dielectric constant lower than that of the insulating region.

Growing community of inventors

Nagoya, Japan

Tsuyoshi Nishiwaki