Tokyo Ohka Kogyo Co., Ltd.

Nsk Corporation

Fuji Xerox Co., Ltd.

Nissan Motor Company Limited

Mahle Filter Systems Japan Corporation

Toyko Ohka Kogyo Co., Ltd.

Tokyo Ohka Co., Ltd.

Tsuyoshi Nakamura

Hiroaki Shimizu

Akiya Kawaue

Jiro Yokoya

Hideto Nito

Kazuishi Tanno

Hideo Hada

Yoshiyuki Utsumi

Takehiro Seshimo

Takahiro Dazai

Masaru Takeshita

Kensuke Matsuzawa

Tomoyuki Hirano

Takeshi Iwai

Takashi Nagamine

Nobuhito Saji

Daiju Shiono

Keita Ishiduka

Yasuhiro Yoshii

Naoto Motoike

Hirokuni Saito

Hideya Higuchi

Kiyoshi Ishikawa

Tsuyoshi Kurosawa

Sanae Furuya

Yoshimasa Sasaoka

JunYeob Lee

Toshio Kawachidani

Munetake Nagata

Masatoshi Arai

Hidekatsu Kohara

Yuichi Suzuki

Tasuku Matsumiya

Kousuke Doi

Takayoshi Mori

Ryuuichi Shiraishi

Atsushi Sawano

Kyoko Ohshita

Komei Hirahara

Taeko Ikegawa

Naoya Kobayashi

Hideki Kon

Atsushi Takahashi

Yoshitaka Komuro

Masato Taniguchi

Kotaro Endo

Takahiro Hamada

Junichi Tsuchiya

Makiko Irie

Toshikazu Tachikawa

Hayao Watanabe

Yoshiki Sugeta

Yoichi Hori

Toshikazu Nanbu

Sadayuki Nakamura

Nobuo Kino

Noriko Uchiyama

Shinichi Hidesaka

Keizo Otani

Takaaki Kaiho

Toshimitsu Kimura

Yosuke Suzuki

Shinji Kumada

Masafumi Fujisaki

Takuma Hojo

Hideyuki Tajimi

Yoshifumi Sugita

Hideyuki Matsushima

Yuu Koiwa

Takurou Yamaguchi

Natsuko Maruyama

Takashi Kuramochi

Ryuichi Shiraishi

Emi Uchida

Souichirou Kaku

Eun Sol Jo

Kosuke Kimura

A resist composition including a base material component (A), an acid generator component (B), and a mixed solvent (S) in which an organic solvent (S1) represented by Formula (s1) is mixed, in which the acid generator component (B) contains a compound (B1) represented by Formula (b1). In the formula, Rrepresents an aryl group. Rand Reach independently represent an aliphatic hydrocarbon group. L, L, and Leach independently represent a divalent linking group or a single bond. Xrepresents a counter anion. Rand Reach independently represent an alkyl group having 1 to 6 carbon atoms

Resist composition and resist pattern forming method

A resist composition including a base material component (A) whose solubility in a developing solution is changed due to an action of an acid, in which the base material component (A) contains a polymer compound (A1) having a constitutional unit (a1) represented by Formula (a1-1). In the formula, R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Vaxrepresents a single bond or a divalent linking group, nrepresents an integer of 0 to 2, and Rrepresents a methyl group or an ethyl group.

A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component including a polymeric compound containing a structural unit having an acid decomposable group, the amount of the structural unit having an acid decomposable group, based on the combined total of all structural units contained in the base component being 51 mol % to 59 mol %, and the structural unit having an acid decomposable group includes a structural unit represented by general formula (a1-1) shown below (in which R represents a hydrogen atom, an alkyl group or a halogenated alkyl group; Z represents a single bond or an alkyl group; and Cis a group represented by general formula (Cp-1) shown below). 

Resist composition and method of forming resist pattern

A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including at least one acid generator (B1) represented by general formula (b1) shown below, at least one acid generator (B2) represented by general formula (b2) shown below, and at least one acid generator (B3) represented by general formula (b3) shown below (wherein IV to Reach independently represents a cyclic group which may have a substituent, a chain alkyl group, or a chain alkenyl group; Yrepresents a single bond or a divalent linking group containing an oxygen atom; Mto Mrepresents a monovalent organic cation; n represents an integer of 1 to 4; m represents an integer of 0 to 4; provided that, when m is 0, the carbon atom adjacent to the sulfur atom within Rhas no fluorine atom bonded thereto).R&#x2014;Y&#x2014;(CF)&#x2014;SOM&#x2003;&#x2003;(b1)R&#x2014;(CH)&#x2014;SOM&#x2003;&#x2003;(b2)R&#x2014;COOM&#x2003;&#x2003;(b3)

A resist composition containing a polymer compound which has a constitutional unit (a0) represented by Formula (a0-1); and an acid generator which is formed of a compound represented by Formula (b1) (in the formulae, Rarepresents an acid dissociable group represented by Formula (a0-r1-1); Ra, Ra, Ra, Ra, and Rarepresent a hydrocarbon group; Yarepresents a quaternary carbon atom; Rrepresents a hydrocarbon group which has a steroid skeleton containing at least one hydroxyl group; Yrepresents a divalent linking group having a single bond or a hetero atom; Vrepresents a single bond, an alkylene group, or a fluorinated alkylene group; and Rrepresents a hydrogen atom, a fluorine atom, or a fluorinated alkyl group). 

A resist composition containing a compound (B1) represented by Formula (b1) in which Rrepresents a monovalent hydrocarbon group which has a steroid skeleton and 17 to 50 carbon atoms, Yand Yeach independently represent a divalent linking group having a hetero atom, Vrepresents a divalent linking group containing a cyclic aliphatic hydrocarbon group, Vrepresents an alkylene group, a fluorinated alkylene group, or a single bond, Rrepresents a hydrogen atom, a fluorine atom, or a fluorinated alkyl group having 1 to 5 carbon atoms, m represents an integer of 1 or greater, and Mrepresents an m-valent organic cation 

Resist composition, method of forming resist pattern, and compound

A resist composition which generates an acid upon exposure and whose solubility in a developing solution is changed due to an action of the acid, the resist composition including a base material component whose solubility in a developing solution is changed due to the action of an acid; and a compound represented by Formula (d1) in which Rand Reach independently represents &#x2014;COO, &#x2014;COOH, or a hydroxyl group, where at least one of Rand Rrepresents &#x2014;COO, R, R, and Reach independently represents a hydroxyl group or a halogen atom, Rto Reach independently represents an alkyl group, nbrepresents an integer of 0 to 4, nband nbeach independently represents an integer of 0 to 2, nbto nbeach independently represents an integer of 0 to 5, m represents 1 or 2, and q represents an integer of 0 to 3.) 

Resist composition, method of forming resist pattern, compound, and acid diffusion control agent

A steel for a high-strength bolt that includes from 0.50 mass % to 0.65 mass % carbon, from 1.5 mass % to 2.5 mass % silicon, 1.0 mass % or more chromium, 0.4 mass % or less manganese, greater than 1.5 mass % molybdenum, 0.03 mass % or less phosphorus and sulfur combined, and balance iron and inevitable impurities.

Steel for high-strength bolt, and high-strength bolt

A resist composition including a polymeric compound having a structural unit represented by formula (a0-1) and an acid generator consisting of a compound represented by general formula (b1-1) in which Rarepresents an acid dissociable group represented by general formula (a0-r1-1); Ra, Ra, Ra, Raand Rarepresent a hydrocarbon; Yarepresents a quaternary carbon atom; Rrepresents a hydrocarbon group having at least 1 hydroxy group as a substituent; Yrepresents a single bond or a divalent linking group containing an oxygen atom; and Vrepresents a single bond, an alkylene group or a fluorinated alkylene group). 

A rotation mechanism includes: a housing; a shaft inserted through a hole provided at the housing; bearings installed at the housing and rotatably supporting the shaft; a rotary member provided at one end portion of the shaft, adapted to be rotated together with the shaft, and having a portion that projects to a radially outer side of the hole and faces the housing with a gap having a predetermined size; and a gas passage adapted to connect the gap to outside of the housing and allow gas contained in a portion of the gap to pass to the outside of the housing.

Rotation mechanism, machine tool, and semiconductor manufacturing device

A sealing mechanism functioning as a separator between two spaces having different pressures includes: a housing; a shaft inserted into the housing; an annular sealing member sealing a gap by contacting a radial outer surface of the shaft or a radial outer surface of a rotary portion fixed to the shaft; and a lubricant groove storing a lubricant to be supplied between the annular sealing member and the radial outer surface.

Sealing mechanism comprising an annular sealing member and a lubricant groove storing a lubricant, a conveyance device, and a manufacturing device comprising a sealing mechanism

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution by the action of acid, which includes a polymeric compound having at least two specific structural units.

Resin composition and method of forming resist pattern

A resist composition which generates an acid through exposure and whose solubility in a developer changes by the action of an acid. The resist composition contains a polymer compound having at least two kinds of specific constituent units. A resist pattern forming method, including forming a resist film on a support using the resist composition, subjecting the resist film to exposure, and forming a resist pattern through patterning by developing the resist film having undergone exposure by using a developer.

A table apparatus includes a first driver applying force in a first axis direction to a table, and a second driver applying force in a second axis direction to the table. The first driver includes a first actuator generating power for moving the table in the first axis direction, and a first movable member moving along a first drive axis parallel to the first axis by actuation of the first actuator. The first movable member includes: a first linear bearing moving along the first drive axis; a first rotary bearing disposed around a first rod member fixed to the first linear bearing and rotatable relative to the first rod member; and a second linear bearing connected to the first rotary bearing and guided in the second axis direction by a second guide member fixed to an edge of the table in the first axis direction.

Table apparatus, positioning apparatus, flat panel display manufacturing apparatus, and precision machine

Provided is a motor capable of more reliably preventing dust generated therein from flowing to the outside. A motor includes a stator, a rotor, a rotor housing which rotates along with the rotor, a stator housing which fixes the stator thereto, includes spaces formed with respect to the rotor housing, and overlaps the rotor housing with first gaps interposed therebetween in the entire circumferential direction, annular members which overlap the stator housing with second gaps interposed therebetween in the entire circumferential direction inside the spaces, exhaust holes which suck and discharge air inside the spaces through the second gaps, and exhaust grooves.

Motor, actuator, semiconductor manufacturing apparatus, and flat display manufacturing apparatus

Growing community of inventors

Kawasaki, Japan

Tsuyoshi Nakamura