Riken Corporation

Hitachi, Ltd.

Honda Motor Co., Ltd.

Nissan Motor Company Limited

Fujikura Rubber Ltd.

Tsuyoshi Matsuda

Ken Harada

Yoshihiko Togawa

Tetsuya Akashi

Noboru Moriya

Yoshio Takahashi

Toshiaki Tanigaki

Shinji Aizawa

Naoki Maruno

Yuji Fujita

Takato Nakamura

Takashi Ogane

Naoki Kimoto

Yoshichika Otani

Yuji Katayama

Michihiro Komatsu

Takashi Kimura

Masako Okochi

An engine includes a variable compression-ratio mechanism adapted to change a compression ratio of an engine and a supercharger adapted to supply a compressed air to the engine. An engine control device that controls the engine controls the variable compression-ratio mechanism by setting target compression ratio such that the higher responsiveness of a supercharging pressure rise by the supercharger is, the lower the target compression ratio is.

Control device of engine and control method of engine

An FRP drive shaft includes an end joint joined to at least one end of an FRP cylinder via an outer collar. The end joint includes a serrated portion on an outer periphery thereof. The outer collar includes a small-diameter collar portion and a large-diameter collar portion. The serrated portion is press-fitted into an inner periphery of the FRP cylinder and fixed to an inner periphery of the small-diameter collar portion. A gap between an inner periphery of the large-diameter collar portion and an outer periphery of the FRP cylinder is filled with an adhesive for fixing the inner periphery of the large-diameter collar portion and the outer periphery of the FRP cylinder to each other. An adhesive-accumulating space which partially increases a filling amount of the adhesive is formed between the inner periphery of the large-diameter collar portion and the outer periphery of the FRP cylinder.

FRP drive shaft

In an interference electron microscope, a first electron biprism is disposed between an acceleration tube and an illumination-lens system, a mask is disposed between the acceleration tube and the first electron biprism, and the first electron biprism is arranged in a shadow that the mask forms. Current densities of first and second electron beams on a parabolic surface of an objective lens system where a sample is positioned are controlled by a control system by an optical action of the illumination-lens system, the mask is imaged on the parabolic surface of the objective lens system, and an electro-optical length between the first electron biprism and the parabolic surface of the objective lens where the sample is positioned is controlled without generating Fresnel fringes on a sample surface from the mask and the first electron biprism.

Interference electron microscope

A battery charge/discharge control apparatus for a vehicle capable of driving an electric motor by a battery is provided. Temperature of the battery is detected, temperature history distribution of the battery after start of temperature detection is calculated, and a lifetime workload of the battery is calculated on the basis of this temperature history distribution of the battery. A permissible value of a workload increase rate indicating a workload to increase per unit distance is calculated on the basis of the lifetime workload of the battery and a travel distance of the vehicle. An actual workload increase rate of the battery is compared with the permissible value of the workload increase rate. In the case where the actual workload increase rate is larger than the permissible value of the workload increase rate, an output is restricted from the output of the battery restricted in a normal driving mode if necessary by a restricted value based upon a difference between the actual workload increase rate and the permissible value of the workload increase rate. This makes it possible to carry out lifetime prolonging control for the battery more accurately by setting up an appropriate charge/discharge permissible amount in accordance with temperature change of the battery in the past.

Battery charge/discharge control apparatus

An electron beam device includes a first electron biprism between an acceleration tube and irradiation lens systems, and an electron biprism in the image forming lens system. The first electron biprism splits the electron beam into first and second electron beams, radiated to differently positioned first and second regions on an objective plane of an objective lens system having a specimen perpendicular to an optical axis. The first and second electron beams are superposed on the observation plane by the electron biprism of the image forming lens system. The superposed region is observed or recorded. Optical action of the irradiation lens system controls each current density of the first and second electron beams on the objective plane having the specimen, and distance on electron optics between the first electron biprism and the objective plane of the objective lens system having the specimen.

Electron beam device including a first electron biprism to split an electron beam into two beams and a second electron biprism in the image forming lens system to superpose the two beams

A double-biprism electron interferometer is an optical system which dramatically increases the degree of freedom of a conventional one-stage electron interferometer. The double biprism interferometer, however, is the same as the optical system of the single electron biprism in terms of the one-dimensional shape of an electron hologram formed by filament electrodes, the direction of an interference area, and the azimuth of the interference fringes. In other words, the longitudinal direction of the interference area is determined corresponding to the direction of the filament electrodes, and the azimuth of the interference fringes only coincides with and is in parallel with the longitudinal direction of the interference area. An interferometer according to the present invention has upper-stage and lower-stage electron biprisms, and operates with an azimuth angle &#x3a6; between filament electrodes of the upper-stage and lower-stage electron biprisms to arbitrarily control an interference area and an azimuth &#x3b8; of the interference fringes formed therein.

Interferometer

In an electron beam interference system using an electron biprism, which is capable of independently controlling each of the interference fringe spacing s and the interference width W, both of which are important parameters for an interferometer and for an interferogram acquired by the interferometer, an optical system used in a two-stage electron biprism interferometer is adopted. The optical system uses two stages of electron biprisms in an optical axis direction to give the flexibility to the relative magnification relative to a specimen image and that relative to an image of a filament electrode of the electron biprism. In addition, as a two-stage configuration in which two objective lenses () are combined, independently controlling the focal length of each objective lens makes it possible to set the relative magnification relative to a specimen image and that relative to an image of the filament electrode of the electron biprism at arbitrary values.

Electron interferometer or electron microscope

The magnetization state of a ferromagnetic material is controlled by applying a current pulse to it while externally applying a weak magnetic field to it. The magnetic state of a ferromagnetic material can be switched between a uniformly magnetized state and a multiple magnetic domain structure by controlling the direction and intensity of the magnetic field applied to it and the intensity and pulse width of the current pulse. When an external magnetic field is applied, the possibility of occurrence of the reversal of the magnetic state upon application of the current pulse shows a hysteresis, and the reversal of the magnetic state can be controlled reliably. The intensity of the magnetic field to be applied may be as weak as a few gauss. Furthermore, by using such magnetic information recording elements, a magnetic information recording device (memory) that can achieve a high degree of integration can be produced.

Magnetization state control device and magnetic information recording device

An interferometer is disclosed which has upper-stage, intermediate-stage, and lower-stage electron biprisms. The disclosed interferometer operates with an azimuth angle &#x3a6; among filament electrodes of the three electron biprisms to arbitrarily control an interference area and an azimuth &#x3b8; of the interference fringes formed therein, eliminates Fresnel fringes generation, and allows independent control of an interference fringe spacing s and the azimuth &#x3b8; of the interference fringes.

Interferometer having three electron biprisms

Charged particle beam equipment having a rotary mechanism in which shift of the observing/machining position incident to the rotary operation of the equipment having the rotary mechanism can be corrected conveniently with high precision in a plane perpendicular to the optical axis of the optical system of charged particle beam or in a slightly inclining plane. An X-Y shift incident to rotation in a plane is determined from the angular information of a rotary mechanism such as a sample holder, diaphragms or biprisms in the charged particle beam equipment, and then driving or controlling is performed to cancel the X-Y shift.

Charged particle beam equipment

The present invention provides a technique enabling to control fringe spacing s and an interference width W independently of each other, which are important parameters for an interferometer using an electron biprism. In the present invention, two electron biprismsare used in two stages along the optical axis, and fringe spacing s and an interference width W are controlled independently of each other by controlling a voltage applied to an electrode of each of the electron biprisms. Also Fresnel diffraction can be suppressed.

Growing community of inventors

Wako, Japan

Tsuyoshi Matsuda