Tokyo Ohka Kogyo Co., Ltd.

Tokyo Institute of Technology

Tokyo Ohka Kogyo., Ltd.

Tokyo Ohka Tokyo Co., Ltd.

Tsuyoshi Kurosawa

Tasuku Matsumiya

Daiju Shiono

Ken Miyagi

Hiroaki Shimizu

Katsumi Ohmori

Hitoshi Yamano

Tomoyuki Hirano

Tsuyoshi Nakamura

Takahiro Dazai

Akiya Kawaue

Takehiro Seshimo

Kotaro Endo

Taku Hirayama

Masahito Yahagi

Kenichiro Miyashita

Hideo Hada

Yoshiyuki Utsumi

Takaya Maehashi

Hideto Nito

Sanae Furuya

Takeshi Iwai

Yuichi Suzuki

Takahiro Senzaki

Makiko Irie

Yasuhiro Yoshii

Daisuke Kawana

Kensuke Matsuzawa

Issei Suzuki

Shinichi Hidesaka

Yuta Iwasawa

Teruaki Hayakawa

Natsuko Maruyama

Takehito Seo

Provided are a curable composition that exhibits favorable adhesiveness without heating at elevated temperatures, and a method for producing a joined structure using the curable composition. As a curable composition for use in forming one or more bonding layers bonding the two or more adherends, in which at least one of the two or more adherends includes a low heat-resistance material, a curable composition that contains an epoxy resin including a structural unit of a specific structure including an epoxy group, and yields a cured product exhibiting a water contact angle of 40&#xb0; or more and 50&#xb0; or less by heating at 80&#xb0; C. or higher and 100&#xb0; C. or lower and an exposure is used.

Curable composition, and production method of joined structure

A method of forming a structure containing a phase-separated structure, the method including applying a block copolymer composition including an organic solvent component (S) and a block copolymer in which a block of polystyrene or a polystyrene derivative is bonded to at least one kind of block to a substrate to form a layer containing the block copolymer; and phase-separating the layer containing the block. The value of an interaction distance Ra(MPa) between the Hansen solubility parameter of the organic solvent component (S) and the Hansen solubility parameter of polystyrene or the polystyrene derivative satisfying the following formula (1).4.1&#x2264;&#x2264;9&#x2003;&#x2003;(1)

Method of producing structure containing phase-separated structure, block copolymer composition, and organic solvent used for block copolymer composition

A method of producing a structure containing a phase-separated structure, which includes mixing a block copolymer which includes a hydrophobic polymer block and a hydrophilic polymer block and is incapable of forming a phase-separated structure, with a homopolymer compatible with the hydrophilic polymer block or a homopolymer compatible with the hydrophobic polymer block.

Method of producing structure containing phase-separated structure and resin composition for forming phase-separated structure

An undercoat agent including a block copolymer having a plurality of blocks bonded formed on a substrate. The undercoat agent contains a resin component that includes a structural unit having an aromatic ring and a structural unit having no aromatic ring, and the resin component includes a group which can interact with the substrate and does not include a 3 to 7-membered, ether-containing cyclic group; and a method of forming a pattern of a layer containing a block copolymer. The method includes applying an undercoat agent to a substrate to form a layer containing the undercoat agent; forming a layer containing a block copolymer having multiple blocks bonded on a surface of the layer containing the undercoat agent, followed by a phase separation of the layer containing the block copolymer; and selectively removing a phase containing at least one block of multiple blocks constituting the block copolymer.

Undercoat agent and method of forming pattern of layer containing block copolymer

A brush composition used for phase-separation of a layer containing a block copolymer on a substrate, the brush composition including a resin component (N), the resin component (N) containing a hydrophobic structural unit (Nx) and a hydrophilic structural unit (Ny), the amount of the structural unit (Ny) within the resin component (N) being 5 mol % or less.

Method of producing structure containing phase-separated structure utilizing a brush composition comprising PS-PMMA

A method of forming a structure containing a phase-separated structure, the method including applying a block copolymer solution to a substrate to form a layer containing a block copolymer and having a film thickness of less than 100 nm; and phase-separating the layer containing the block copolymer, a solvent of the block copolymer solution comprising a poor solvent exhibiting a poor solubility for a homopolymer A of one of the blocks of the block copolymer.

Method of producing structure containing phase-separated structure

A brush composition used for phase-separation of a layer containing a block copolymer having plural kinds of blocks bonded formed on a substrate, the brush composition including a resin component, the resin component having a structural unit (u1) represented by genera formula (u1-1), and having a hydroxy group on at least one terminal portion of the main chain thereof: in formula (u1-1), R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Rrepresents a halogen atom, or a linear, branched or cyclic hydrocarbon group of 1 to 20 carbon atoms optionally containing an oxygen atom, a halogen atom or a silicon atom, or a combination of the linear, branched or cyclic hydrocarbon group; and p represents an integer of 1 to 5. 

Brush composition, and method of producing structure containing phase-separated structure

A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid, an acid generator component (B) which generates acid upon exposure, and a nitrogen-containing organic compound component (D), wherein the acid generator component (B) includes an acid generator (B1) containing a compound represented by general formula (b1-1) shown below, and the nitrogen-containing organic compound component (D) includes a compound (D1) represented by general formula (d1) shown below. In the formula, Yrepresents an alkylene group of 1 to 4 carbon atoms which may have a substituent, Rrepresents an alkyl group, alkoxy group, halogen atom, halogenated alkyl group, hydroxyl group or oxygen atom (&#x2550;O), p represents 0 or 1, and Zrepresents an organic cation. 

Resist composition, method of forming resist pattern

A method of producing a structure containing a phase-separated structure, including applying a neutralization film to a substrate to form a layer of a neutralization film; applying a block copolymer having a plurality of polymers bonded thereto, and a weight average molecular weight of 150,000 or more to the layer of the neutralization film, so as to form a layer containing the block copolymer and having a coating film thickness of 23 nm or less; and phase-separating the layer containing the block copolymer.

Method of producing structure containing phase-separated structure, phase separated structure, and block copolymer composition

A method of producing a structure containing a phase-separated structure, including a step in which a layer including an Si-containing block copolymer having a plurality of blocks bonded is formed between guide patterns on a substrate; a step in which a solution of a top coat material is applied to the layer and the guide patterns so as to form a top coat film; and a step in which the layer including the Si-containing block copolymer and having the top coat film formed thereon is subjected to annealing treatment so as to conduct a phase separation of the layer; in which a solvent of the solution of the top coat material contains no basic substance.

Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern

A method of producing a structure containing a phase-separated structure, including forming, on a substrate, a layer containing a block copolymer having a block of a polyhedral oligomeric silsesquioxane structure-containing structural unit; forming a top coat film by applying, to the layer containing the block copolymer, a top coat material which undergoes a change in polarity upon heating, and controls a surface energy of the layer containing the block copolymer; and subjecting the layer containing the block copolymer on which the top coat film is formed to phase separation by thermal annealing.

Method of producing structure containing phase-separated structure, method of forming pattern, and top coat material

A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a polymeric compound (A1) including a structural unit (a0) represented by general formula (a0-1) and a structural unit (a1) containing an acid decomposable group which exhibits increased polarity by the action of acid (Rrepresents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; W represents &#x2014;COO&#x2014;, a &#x2014;CONH&#x2014; group or a divalent aromatic hydrocarbon group; Yand Yrepresent a divalent linking group or a single bond; R'represents a hydrogen atom or an alkyl group of 1 to 6 carbon atoms; R&#x2032;represents a monovalent aliphatic hydrocarbon group; and Rrepresents an &#x2014;SO&#x2014; containing cyclic group). 

Resist composition and method of forming resist pattern

A resist composition for immersion exposure, including a base component (A) that exhibits changed solubility in an alkali developing solution under action of acid, an acid generator component (B) that generates acid upon exposure, and a fluorine-containing compound (C) represented by general formula (c-1) (in formula (c-1), Rrepresents an organic group which may contain a polymerizable group; X represents a divalent organic group having an acid dissociable portion; and Rrepresents an organic group having a fluorine atom). 

Resist composition for immersion exposure and method of forming resist pattern using the same

A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure. 

Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound

A positive resist composition including: 

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Kawasaki, Japan

Tsuyoshi Kurosawa