Canon Kabushiki Kaisha

Molecular Imprints, Inc.

Canon Nanotechnologies, Inc.

Tsuyoshi Arai

Yutaka Mita

Yoshimasa Araki

Yuichi Takahashi

Tohru Ishibashi

Akio Saito

Yoshikazu Miyajima

Makoto Mizuno

Byung-Jin Choi

Noriyasu Hasegawa

Yukio Takabayashi

Steven C Shackleton

Koichi Kitakami

Shinichi Shudo

Masahiro Kuri

Kunihiko Asada

Takefumi Tamura

Tomonobu Saku

Kensuke Tone

A liquid discharge apparatus includes: a discharge head including a discharge portion configured to discharge a liquid; a cap configured to cap the discharge portion; a suction unit configured to suck an interior of the cap through a first fluid passage communicating with the interior of the cap in a state in which the cap caps the discharge portion; an open/close unit configured to open/close a second fluid passage communicating with the interior of the cap, the open/close unit being set in an open state when a negative pressure state of the interior of the cap, which is generated by suction by the suction unit, is canceled; and a filter arranged in the second fluid passage.

Liquid discharge apparatus, imprint apparatus, and method

An ejection material is injected into a container through a pipe. Thereafter, the pipe is blocked at a blocked part and then the pipe is cut off. The pipe is cut off such that the blocked part is included in a portion of the pipe connected to the container.

Ejection-material injecting method, ejection-material ejection apparatus, and imprinting apparatus

A liquid discharge apparatus comprises a head including a discharge port surface, a first reservoir that stores the liquid to be supplied to the head, a flexible member, separating an inner space of the first reservoir into a first chamber that stores the liquid and a second chamber that stores an operation liquid, a second reservoir communicating with the second chamber, the second reservoir storing the operation liquid to be supplied to the second chamber, the second reservoir being disposed in such a manner that a liquid surface of the operation liquid stored in the second reservoir is positioned below the discharge port surface, and an adjustment unit that performs adjustment in such a manner that a position of the liquid surface of the operation liquid in the second reservoir falls within a predetermined range in a state where the second reservoir is opened to atmosphere.

Liquid discharge apparatus, imprint apparatus and part manufacturing method

There is provided an ejection material receiving unit capable of increasing the filling amount of ejection material with as little enlargement of the container itself as possible and an ejection material ejecting apparatus including the unit. Therefore, an ejection material receiving unit includes: a first receiving space capable of receiving ejection material; a second receiving space capable of receiving liquid; and a flexible member separating the first receiving space and the second receiving space, and is characterized in that the flexible member has a concave part which takes a concave shape in a state where the first receiving space is not filled with the ejection material and the second receiving space is not filled with the liquid, and the concave shape is a shape dented toward the second receiving space from the first receiving space, and is also a shape conforming to a wall forming the second receiving space.

Ejection material receiving unit, ejection material ejecting apparatus, and manufacturing method of flexible member

Provided is an application device capable of extracting an imprinting material in which impurities are mixed from a container of the application device and supplying new imprinting material to the container of the application device. An application device according to the present disclosure is used to supply an imprinting material to a substrate in an imprinting apparatus that forms a pattern on the imprinting material on the substrate by using a mold. The application device includes a container unit that contains the imprinting material, and an ejecting unit that is provided on the container unit and that ejects the imprinting material contained in the container unit toward the substrate. The application device is detachably attachable to the imprinting apparatus.

Application device, imprinting apparatus, and method for manufacturing object

Provided is a liquid discharge apparatus, including: a head having an discharge port surface in which an discharge port array is provided, the discharge port array including a plurality of discharge ports which discharges liquid and is arranged along a first direction; a suction port performing a suction operation for the discharge port surface; and a control unit causing the suction port to move in a second direction intersecting the first direction under a state in which the suction port is spaced away from the discharge port surface.

Liquid discharge apparatus, imprint apparatus, and method of manufacturing a component

A liquid supply apparatus which supplies a liquid to an object, includes a discharger configured to discharge a liquid; a driving mechanism configured to arrange the discharger at a plurality of positions including a first position and a second position; a first exhaust port arranged so as to face the discharger arranged at the first position and configured to exhaust heat generated by the discharger arranged at the first position; and a second exhaust port arranged so as to face the discharger arranged at the second position and configured to exhaust heat generated by the discharger arranged at the second position.

Liquid discharge apparatus, imprint apparatus, and method of manufacturing article

The present invention provides an imprint apparatus including a chamber configured to define a first space including a processing unit which includes a discharge unit configured to discharge an imprint material onto a substrate and is configured to perform an imprint process of forming a pattern of the imprint material on the substrate by using a mold, and an enclosure configured to define a second space including a tank configured to store the imprint material supplied to the discharge unit, wherein the tank has a first opening open to the second space, and the enclosure has a supply port configured to supply, to the second space via the first opening, a gas cleaner than a gas supplied to the first space.

Imprint apparatus, method of manufacturing article, and supply apparatus

The present invention provides an imprint apparatus which forms a pattern on an imprint material on a shot region on a substrate by using a mold, the apparatus comprising a supply unit having a plurality of discharge outlets each of which is configured to discharge the imprint material, and configured to supply the imprint material to the substrate, and a control unit configured to control the supply unit so as to supply the imprint material from the plurality of discharge outlets onto the shot region, wherein the control unit determines discharge outlets to be used to supply the imprint material to the shot region among the plurality of discharge outlets based on discharge history information indicating a history of discharge of the imprint material from each of the plurality of discharge outlets.

Imprint apparatus and method of manufacturing article

Provided is a liquid discharging apparatus, including: a head having a discharging port surface on which discharging ports are formed, and configured to perform a discharging operation for discharging liquid through the discharging ports; a suction port configured to perform a suction operation for the discharging port surface; a pressure changing unit configured to change a pressure in the head; and a control unit configured to perform the suction operation under a state in which the pressure changing unit has changed the pressure in the head in a positive pressure direction with respect to a pressure that is set during the discharging operation and the suction port is spaced away from the discharging port surface.

Liquid discharging apparatus, imprint apparatus, and method of manufacturing a component

The present invention provides an imprint apparatus which performs an imprint process of molding an imprint material on a substrate using a mold and forming a pattern on the substrate, the apparatus including a substrate chuck configured to hold the substrate, a protective plate configured to surround the substrate chuck, and a suction mechanism configured to suction at least a part of a gap between the substrate chuck and the protective plate, wherein while the suction mechanism suctions at least the part of the gap, the substrate chuck holds a plate which is different from the substrate on which the pattern is to be formed.

Imprint apparatus, foreign particle removal method, and method of manufacturing article

A liquid discharge apparatus includes: a container divided into a first chamber and a second chamber by a dividing member, the first chamber including a discharge outlet that discharges a liquid and configured to contain the liquid, the second chamber configured to contain a fluid; a tank configured to store the fluid; a connecting portion that provides fluid communication between the tank and the second chamber; a measurement unit configured to measure an amount of the fluid supplied from the tank to the second chamber; and a controller configured to obtain an amount of the liquid contained in the first chamber based on a measurement result from the measurement unit.

Liquid discharge apparatus, imprint apparatus, and article manufacturing method

The present invention provides an imprint apparatus which forms a pattern on a substrate, the apparatus including a supply unit including a discharge outlet which discharges the imprint material and configured to supply the imprint material onto the substrate via the discharge outlet, and a generation unit configured to generate ions by irradiating, with soft X-rays, a second space away from a first space between the mold and the substrate, wherein the discharge outlet and the generation unit are arranged to sandwich a side face of the mold, and a charge is removed in the first space by supplying the ions generated in the second space to the first space.

The present invention provides an imprint apparatus which performs an imprint process of transferring a pattern onto a substrate, the apparatus comprising a deforming unit configured to deform the pattern surface by applying a force to the mold, an obtaining unit configured to obtain thickness information of the mold, a calculation unit configured to calculate a force to be applied to the mold based on the thickness information of the mold obtained by the obtaining unit, so that the pattern surface has a target shape in the imprint process, and a control unit configured to control the deforming unit to apply the force calculated by the calculation unit to the mold in the imprint process.

Growing community of inventors

Utsunomiya, Japan

Tsuyoshi Arai