Sawai Pharmaceutical Co., Ltd.

Tsuyako Yashima

Ikuo Ueda

Takeshi Shogaki

Takao Kakita

Hiromu Toyoda

Masumi Furukawa

Seiichi Nakatsugi

Emi Masai

1. A compound of the formula: ##STR1## wherein the symbol of a solid line with a broken line means a single bond or a double bond, R and R' are independently selected from the group consisting of hydrogen atom, halogen atom, lower alkyl, nitro, unsubstituted amino and substituted amino, A and B are independently selected from the group consisting of hydrogen atom, lower alkyl optionally substituted with a lower cycloalkyl, aryl optionally substituted with one or more halogen atoms and the group: -Y-R.sup.2 wherein Y is lower alkylene and R.sup.2 is the group: ##STR2## wherein m is integer of 1 to 3, n is 0 or 1, Z is &gt;N-, &gt;CH-- or &gt;C=, R.sup.3 is diaryl (lower) alkyl optionally substituted with one or more halogen atoms or is condensed heterocyclic group optionally substituted with oxo, with the proviso that (a) at least one of A and B is the group -Y-R.sup.2 and (b) when A is hydrogen atom and B is the group -Y-R.sup.2, then Z is &gt;CH-- or &gt;C= if R.sup.3 is condensed heterocyclic group optionally substituted with oxo and n is O or a pharmaceutically acceptable salt thereof. The compounds of the above formula have antiallergic activity.

Carbostyril derivatives and antiallergic agent

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Nara, Japan

Tsuyako Yashima