Komag Corporation

Other

Wd Media, LLC

Tsutomu Tom Yamashita

Tu Chen

Rajiv Yadav Ranjan

Wen Hong Liu

Ting Joseph Yuen

Keith Kadokura

John Ko-Jen Chen

Ching-Cheng Shir

Miaogen Lu

Ching Jackie Tsoi

Eric Woo Hock Yong

Shigeto Hashimoto

Kyou H Lee

Gerardo Bertero

Michinobu Suekane

Makoto Imakawa

Charles Changqing Chen

Bruce Lairson

Ga-Lane Chen

Mark D Moravec

Sudhir S Malhotra

Phuong Binh Nguyen

Donald C Stafford

Li-Ju J Lin

Tuqiang Li

Yuri Trachuk

Javier Wong

Tracy L Scott

Yasuo Sakane

John K-j Chen

John Ko-Chen Chen

Hongchuan Wong

Douglas Allan Iams

Gang Peng

Bruce Jairson

Tam Huu-Minh Nguyen

Media may be produced with narrow c-axis dispersion while having small grain size and high grain density. A dual seed layer design and a substrate bias voltage may be applied during deposition of the seed layer are used in the media. In some embodiments, the first seed layer is an amorphous material because of a high content of elements with large atomic sizes. Application of the substrate bias during deposition of the second seed layer may reduce the grain size and may narrow c-axis dispersion.

Magnetic recording media with small grain size and narrow c-axis dispersion by using dual seed layer with substrate bias

A method for making a magnetic disk comprises forming first and second protective carbon layers on a magnetic layer. The first protective carbon layer is predominantly SP3 carbon. The second protective carbon layer comprises about 50% or less SP3 carbon. The second protective carbon layer is very thin, e.g. between 0.1 and 1.0 nm thick. A lubricant layer (e.g. a perfluoropolyether lubricant) is applied to the second protective carbon layer. The second protective carbon layer facilitates improved cooperation between lubricant and the disk.

Magnetic disk comprising a first carbon overcoat having a high SP3 content and a second carbon overcoat having a low SP3 content

A Co-Pt based magnetic alloy which has been doped with a relatively high amount of nitrogen, e.g., or above 1 at. % is obtained having high coercivity, for example in the range of 1400 Oe or above, and an increased signal-to-noise ratio as compared to the same Co-Pt based alloy which has not been doped with nitrogen. The alloy is vacuum deposited, for example, by sputtering, and the nitrogen may be introduced from the sputtering gas or from the sputtering target. Other low-solubility elements providing the grain uniformity and isolation include: B, P, S, C, Si, As, Se and Te.

Thin film magnetic alloy having low noise, high coercivity and high squareness

In this invention, an ultra thin layer of CoCr alloy nucleation layer is sputtered at an extremely low deposition rate above a predominantly (200) oriented Cr film followed by a CoCrPt based alloy sputtered film at higher rates and moderate temperatures. This structure creates a media which has very high Hc, and excellent PW50, low noise and excellent low TNLD values. By using this technique, the CoCrPt magnetic film achieves excellent in-plane crystallographic orientation, and high Hc is achieved with minimal amount of Pt addition to the magnetic film. The method allows very fine grain structure of cobalt to be formed which contributes to good signal to noise ratio. A fine grain structure combined with chromium segregation between the grains improve the signal to noise ratio even more. A high degree of in-plane c-axis orientation is achieved in the cobalt layer which provides very high hysteresis loop squareness which helps to improve the OW and TNLD. The perfection of the grains is very high so that high anisotropy is obtained in the magnetic layer, resulting in high Hc without the necessity of addition of high level of Pt. The high degree of crystalline perfection also contributes to low TNLD.

Ultra-thin nucleation layer for magnetic thin film media and the method for manufacturing the same

Ultra-thin nucleation layer for magnetic thin film media and the method

A method of manufacturing a magnetic disk comprises the steps of: a) providing a substrate with a layer of an amorphous multi-component material at its surface; b) irradiating the amorphous layer (e.g. by applying heat from a heating element, laser beam, or the like) to thereby create micro-structurally changed regions in the amorphous layer; and c) chemo-mechanically polishing the amorphous layer to produce micro-texture features at or near the micro-structurally changed regions. The disk is then completed by depositing additional layers such as an underlayer, a magnetic layer, a protective overcoat, etc.

Micro-texture media made by polishing of a selectively irradiated surface

Sputtering method for producing amorphous hydrogenated carbon thin films with high sp.sup.3 content. By sputtering the carbon with a pulsed DC power supply having high voltage peaks, a carbon film with remarkably high sp.sup.3 bonding fraction can be obtained. Previously, carbon films with a very high sp.sup.3 fraction film with content as high (e.g. as 80%) could only be produced by methods such as filtered cathodic arc deposition or chemical vapor deposition methods (CVD) such as plasma-enhanced chemical vapor deposition (PE-CVD) and ion-beam deposition operating at some narrowly defined range of deposition conditions. It is very advantageous to use sputtering to create a high sp.sup.3 content film, since sputtering is more manufacturable and has higher productivity compared to CVD or ion-beam deposition methods. The resultant carbon film has excellent durability and corrosion resistance capability down to very low thickness. Also compared to PE-CVD and ion-beam deposition, the new sputtering process produce much less particles and the process can be run on a manufacturing tool for much longer time, thereby increasing the productivity of the machine, and providing disks with higher quality.

Method of sputtering a carbon protective film on a magnetic disk with

A Co--Pt based magnetic alloy which has been doped with a relatively high amount of nitrogen, e.g., at or above 1 at. % is obtained having high coercivity, for example in the range of 1400 Oe or above, and an increased signal-to-noise ratio as compared to the same Co--Pt based alloy which has not been doped with nitrogen. The alloy is vacuum deposited, for example, by sputtering, and the nitrogen may be introduced from the sputtering gas or from the sputtering target. Other low-solubility elements providing the grain uniformity and isolation include: B, P, S, C, Si, As, Se and Te.

Thin film magnetic alloy having low noise, high coercivity and high

A Co--Pt based magnetic alloy which has been sputtered with an oxide or nitride of a primary constituent of the magnetic layer, e.g., CoO below about 10 at. %, provides improved coercivity, squareness, and reduced noise as compared to magnetic alloys with oxygen introduced by other methods. The alloy is vacuum deposited, for example, by sputtering, and the oxide or nitride may be introduced from the sputtering target from which the magnetic layer materials come or from a separate sputtering target. Examples of such oxides and nitrides include CoO, Co.sub.2 0.sub.3, Co.sub.3 O.sub.4, CrO.sub.2, Cr.sub.2 O.sub.3, TiO.sub.2, Ta.sub.2 O.sub.5, Al.sub.2 O.sub.3, WO, CoN, Co.sub.2 N, TiN, TaN, CrN, NiN, etc.

Method of sputtering selected oxides and nitrides for forming magnetic

A new magnetic alloy exhibits high Hc and Ms while exhibiting excellent corrosion resistance, thereby providing ideal physical properties for high density recording applications. Other parameters of the media, such as SNR, PW50, and S are at least maintained, if not also improved. The alloy contains cobalt and up to 10 at. % Ni, up to 20 at. % Pt, up to 10 at. % Ta, up to 10 at. % Ti, and optionally up to 6 at. % B. The ratio of the tantalum to titanium in the alloy is between 3:1 and 1:3. The alloy is deposited by vacuum deposition (typically sputtering) on a similarly deposited non-magnetic alloy under layer. Nitrogen and/or oxygen may be introduced into the alloy during deposition to improve SNR. Other corrosion-resistant thin film alloys may also be obtained by the inclusion of Ta and Ti.

Magnetic alloy for improved corrosion resistance and magnetic performance

Thin film magnetic alloy having low noise, high coercivity, and high

A Co--Pt based magnetic alloy which has been sputtered with an oxide or nitride of a primary constituent of the magnetic layer, e.g., CoO below about 10 at. %, provides improved coercivity, squareness, and reduced noise as compared to magnetic alloys with oxygen introduced by other methods. The alloy is vacuum deposited, for example, by sputtering, and the oxide or nitride may be introduced from the sputtering target from which the magnetic layer materials come or from a separate sputtering target. Examples of such oxides and nitrides include CoO, Co.sub.2 O.sub.3, Co.sub.3 O.sub.4, CrO.sub.2, Cr.sub.2 O.sub.3, TiO.sub.2, Ta.sub.2 O.sub.5, Al.sub.2 O.sub.3, WO, CoN, Co.sub.2 N, TiN, TaN, CrN, NiN, etc.

Method for forming an improved magnetic media including sputtering of

Definition of the required geometry of the air bearing surface ('ABS') of a magnetic head slider is achieved while providing an ABS which exhibits low wear, low friction, and low stiction at its interface with a disk surface, by securely embedding monocrystalline diamond particles into a lapping plate, removing substantially all particles from the plate which are not firmly affixed thereto, and lapping the slider in a linear, X-Y direction at a relatively high lapping pressure. Material susceptible to being dislodged during CSS is removed during the lapping process. Thus, the incidence of material dislodging from the ABS and increasing wear-induced stiction is substantially reduced, resulting in improved CSS performance. A desired microtexture is also applied to the ABS. Reduced pole tip recession is also observed.

CSS magnetic recording head slider and method of making same

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San Jose, CA, United States of America

Tsutomu Tom Yamashita